Shape-controlled fabrication of micro/nanoscale triangle, square, wire-like, and hexagon pits on silicon substrates induced by anisotropic diffusion and silicide sublimation

ACS Nano

Volumn 4, Issue 5, 2010, Pages 2901-2909

  Wang, Huatao ^a   Zhang, Zhou ^a   Wong, Lai Mun ^b   Wang, Shijie ^b   Wei, Zhipeng ^a   Li, Gong Ping ^a   Xing, Guozhong ^a   Guo, Donglai ^a   Wang, Dandan ^a   Wu, Tom ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Anisotropic diffusion; Morphology control; Pits; Silicide

Indexed keywords

ANISOTROPIC DIFFUSION; ANISOTROPIC DIFFUSIVITY; AU-NANOPARTICLES; COBALT SILICIDE; DIFFUSION COEFFICIENTS; EXPERIMENTAL CONDITIONS; MORPHOLOGICAL EVOLUTION; MORPHOLOGY CONTROL; NANO-DEVICES; NANO-ISLANDS; NANOFABRICATION; NEW TECHNOLOGIES; PIT MORPHOLOGY; POTENTIAL APPLICATIONS; SHAPE CONTROL; SHAPE-CONTROLLED; SI (1 1 1); SI SURFACES; SI-BASED; SILICON SUBSTRATES; SIZE CONTROL; SUBSTRATE ORIENTATION; TEMPERATURE DEPENDENCE; VAPOR TRANSPORT METHODS;

COBALT; DRUG PRODUCTS PLANTS; GOLD; MORPHOLOGY; OPTICAL ANISOTROPY; SILICIDES; SILICON; SUBLIMATION; SUBSTRATES;

DIFFUSION;

EID: 77952905828     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn1000996     Document Type: Article

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