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Volumn 94, Issue 8, 2003, Pages 4776-4780
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Simultaneous, multilayer plasma etching and deposition of fluorocarbon layers on silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
ION BOMBARDMENT;
MATHEMATICAL MODELS;
MULTILAYERS;
PLASMA ETCHING;
SILICON;
ION ENERGY;
FLUOROCARBONS;
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EID: 0242367278
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1606857 Document Type: Article |
Times cited : (5)
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References (17)
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