Anisotropic etching of the silicon crystal-surface free energy model

Materials Science in Semiconductor Processing

Volumn 6, Issue 4, 2003, Pages 235-241

  Łysko, Jan M ^a  

^a Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

Author keywords

Anisotropy; Crystal; Etching; Model; Silicon

Indexed keywords

ACTIVATION ENERGY; ANISOTROPY; CHEMICAL BONDS; CRYSTAL LATTICES; CRYSTALS; ETCHING; FREE ENERGY; SEMICONDUCTING SILICON; SURFACES;

CRYSTAL SURFACES;

MATERIALS SCIENCE;

EID: 0242526744     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2003.09.003     Document Type: Article

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