Controlled formation and resistivity scaling of nickel silicide nanolines

Nanotechnology

Volumn 20, Issue 8, 2009, Pages

  Li, Bin ^a,c   Luo, Zhiquan ^a   Shi, Li ^a   Zhou, Jiping ^a   Rabenberg, Lew ^a   Ho, Paul S ^a   Allen, Richard A ^b   Cresswell, Michael W ^b  

^a The University of Texas at Austin   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYOGENIC TEMPERATURES; DEVICE PERFORMANCE; ELECTRICAL MEASUREMENTS; ELECTRICAL RESISTIVITIES; ELECTRON MEAN FREE PATHS; LINE WIDTHS; NANOLINES; NICKEL SILICIDES; ROOM TEMPERATURES; TECHNOLOGY NODES; TOP-DOWN METHODS;

ELECTRIC RESISTANCE; ELECTRIC WIRE; ELECTRON ENERGY LOSS SPECTROSCOPY; NICKEL ALLOYS;

SILICIDES;

NANOWIRE; NICKEL; NICKEL SILICIDE; SILICONE DERIVATIVE; UNCLASSIFIED DRUG; NANOTUBE; SILICON DERIVATIVE; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; ELECTRIC RESISTANCE; ELECTRON; NANODEVICE; NANOFABRICATION; NANOTECHNOLOGY; PRIORITY JOURNAL; TEMPERATURE SENSITIVITY; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOTECHNOLOGY; NANOTUBES; NICKEL; PARTICLE SIZE; SILICON COMPOUNDS; SURFACE PROPERTIES; TITANIUM;

EID: 65249101658     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/8/085304     Document Type: Article

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