Formation of micromeshes by nickel silicide

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 208-210

  Ueda, Kazuyuki ^a   Yoshimura, Masamichi ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Nesting; Nickel silicide; Si(001); Thermal etch pit; Thin film

Indexed keywords

DIFFUSION; EVAPORATION; HEATING; LATTICE CONSTANTS; MONOLAYERS; PHASE DIAGRAMS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; ULTRAHIGH VACUUM;

HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPE (HRSEM); NESTING; NICKEL SILICIDE; THERMAL ETCH PIT;

NICKEL COMPOUNDS;

EID: 4544302942     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.071     Document Type: Article

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