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See the Supporting Information for more details
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See the Supporting Information for more details.
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The SSP was placed close to the upstream entrance to the furnace at about 150°C, sublimed, and carried downstream by a flow of 150 sccm of argon. NW growth was done at 750°C and 200 Torr for 20-25 min.
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SEM imaging was carried out with a LEO SUPRA 1530 FESEM with as-grown substrates. For HRTEM imaging, the NWs were sonicated and suspended in ethanol, dispersed onto lacey carbon film TEM grids, and imaged with a Philips CM200 UT TEM with an accelerating voltage of 200 kV.
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2. After standard photolithography using Shipley S1805 photoresist was carried out with such substrates, the nanowires were etched in 5% HF for 2 s and rinsed thoroughly in DI water, before deposition of metal films of Ti (50 nm) followed by Au (60 nm) using electron-beam or thermal evaporation.
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0001020216
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