Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

Journal of Applied Physics

Volumn 79, Issue 3, 1996, Pages 1416-1422

  Schwan, J ^a   Ulrich, S ^a   Roth, H ^a   Ehrhardt, H ^a   Silva, S R P ^b   Robertson, J ^b   Samlenski, R ^c   Brenn, R ^c  

^a University of Koblenz Landau   (Germany)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF FREIBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038166605     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360979     Document Type: Article

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