Stress-induced wrinkling of sputtered SiO 2 films on polymethylmethacrylate

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 2, 2006, Pages 324-327

  Serrano, Justin R ^a   Xu, Qinqin ^b   Cahill, David G ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

FILM DEPOSITION; NANOMETERS;

POLYMETHYL METHACRYLATES; SATURATION (MATERIALS COMPOSITION); SILICA; SILICON; SPUTTERING; SURFACE ROUGHNESS;

THIN FILMS;

EID: 33644541823     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2171711     Document Type: Article

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