Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: The effect of different gas mixtures

Journal of Physics D: Applied Physics

Volumn 43, Issue 20, 2010, Pages

  Mao, M ^a   Bogaerts, A ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BACKGROUND GAS; CARBON NANOFIBRES; CARBON SOURCE; DECOMPOSITION RATE; GROWTH PRECURSORS; HYBRID MODEL; HYBRID PLASMA EQUIPMENT MODEL; INDUCTIVELY-COUPLED; LONG CHAIN HYDROCARBONS; MODERATE PRESSURES; PLASMA CHEMISTRIES; PLASMA PROPERTIES; ALIGNED CNTS; BIAS POWER; GAS PRESSURES; GAS RATIO; HYDRO-CARBON GAS; INDUCTIVELY COUPLED PLASMA POWER; INTERMEDIATE SUBSTRATES; OPERATING PRESSURE; OPTIMIZED CONDITIONS; PARAMETER STUDIES; PROCESSING PARAMETERS;

CHEMICAL VAPOR DEPOSITION; ELECTROMAGNETIC INDUCTION; GAS MIXTURES; HYDROCARBONS; INDUCTIVELY COUPLED PLASMA; SYNTHESIS (CHEMICAL); CHEMISTRY; HYDROCARBON REFINING; NANOTUBES;

CARBON NANOTUBES; SINGLE-WALLED CARBON NANOTUBES (SWCN);

EID: 77952416662     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/20/205201     Document Type: Article

References (99)

1. Iijima S 1991 Nature 354 56-8
2. Tseng G Y and Ellenbogen J C 2001 Science 294 1293-4
3. Darkrim F L, Malbrunot P and Tartaglia G P 2002 Int. J. Hydrogen Energy 27 193-202
4. Guillorn M A, Melechko A V, Merkulov V I, Ellis E D, Simpson M L, Baylor L R and Bordonaro G J 2001 J. Vac. Sci. Technol. B 19 2598-601
5. Meyyappan M, Delzeit L, Cassell A and Hash D 2003 Plasma Sources Sci. Technol. 12 205-16
6. Journet C, Maser W K, Bernier P, Loiseau A, delaChapelle M L, Lefrant S, Deniard P, Lee R and Fischer J E 1997 Nature 388 756-8
7. Yudasaka M, Komatsu T, Ichihashi T and Iijima S 1997 Chem. Phys. Lett. 278 102-6
8. Lee C J, Kim D W, Lee T J, Choi Y C, Park Y S, Lee Y H, Choi W B, Lee N S, Park G S and Kim J M 1999 Chem. Phys. Lett. 312 461-8
9. Cui H, Zhou O and Stoner B R 2000 J. Appl. Phys. 88 6072-4
10. Bower C, Zhu W, Jin S H and Zhou O 2000 Appl. Phys. Lett. 77 830-2
11. Gulas M, Le Normand F and Veis P 2009 Appl. Surf. Sci. 255 5177-80
12. Chhowalla M, Teo K B K, Ducati C, Rupesinghe N L, Amaratunga G A J, Ferrari A C, Roy D, Robertson J and Milne W I 2001 J. Appl. Phys. 90 5308-17
13. Bell M S, Lacerda R G, Teo K B K, Rupesinghe N L, Amaratunga G A J, Milne W I and Chhowalla M 2004 Appl. Phys. Lett. 85 1137-9
14. Hofmann S, Ducati C, Robertson J and Kleinsorge B 2003 Appl. Phys. Lett. 83 135-7
15. Okita A, Suda Y, Oda A, Nakamura J, Ozeki A, Bhattacharyya K, Sugawara H and Sakai Y 2007 Carbon 45 1518-26
16. Hiramatsu M, Shiji K, Amano H and Hori M 2004 Appl. Phys. Lett. 84 4708-10
17. Delzeit L, McAninch I, Cruden B A, Hash D, Chen B, Han J and Meyyappan M 2002 J. Appl. Phys. 91 6027-33
18. Cruden B A and Meyyappan M 2005 J. Appl. Phys. 97 084311
19. Matthews K, Cruden B A, Chen B, Meyyappan M and Delzeit L 2002 J. Nanosci. Nanotechnol. 2 475-80
20. Weng C H, Yang C S, Lin H, Tsai C H and Leou K C 2008 J. Nanosci. Nanotechnol. 8 2526-33
21. Yang C S 2005 Low Temperature Growth of Single-Walled Carbon Nanotubes by PECVD MSc Thesis (Hsinchu, Taiwan: Department of Engineering and System Science, National Tsing Hua University) p 88
22. Ostrikov K, Tsakadze Z, Rutkevych P P, Long J D, Xu S and Denysenko I 2005 Contrib. Plasma Phys. 45 514-21
23. Caughman J B O, Baylor L R, Guillorn M A, Merkulov V I, Lowndes D H and Allard L F 2003 Appl. Phys. Lett. 83 1207-9
24. Lin Y Y, Wei H W, Leou K C, Lin H, Tung C H, Wei M T, Lin C and Tsai C H 2006 J. Vac. Sci. Technol. B 24 97-103
25. Wei H W 2008 Study of Growth of Vertically-Aligned Carbon Nanofibers by Plasma Enhanced Chemical Vapor Deposition Growth Mechanism and Field Emission Characterization PhD Thesis Hsinchu, Taiwan: Department of Engineering and System Science, National Tsing Hua University p 175
26. Hash D, Bose D, Govindan T R and Meyyappan M 2003 J. Appl. Phys. 93 6284-90
27. Hash D B, Bell M S, Teo K B K, Cruden B A, Milne W I and Meyyappan M 2005 Nanotechnology 16 925-30
28. Okita A, Suda Y, Ozeki A, Sugawara H, Sakai Y, Oda A and Nakamura J 2006 J. Appl. Phys. 99 0143021-7
29. Oda A, Suda Y and Okita A 2008 Thin Solid Films 516 6570-4
30. Denysenko I B, Xu S, Long J D, Rutkevych P P, Azarenkov N A and Ostrikov K 2004 J. Appl. Phys. 95 2713-24
31. Ostrikov K, Yoon H J, Rider A E and Vladimirov S V 2007 Plasma Process. Polym. 4 27-40
32. Teo K B K et al 2004 IEE Proc.-Circuits Devices Syst. 151 443-51
33. Koohsorkhi J, Hoseinzadegan H, Mohajerzadeh S, Soleimani E A, Koohsorkhi J and Arzi E 2005 Fullerenes Nanotubes Carbon Nanostruct. 13 355-64
34. Shimoi N and Tanaka S 2008 J. Ceram. Process. Res. 9 437-9
35. Cassell A M, Ye Q, Cruden B A, Li J, Sarrazin P C, Ng H T, Han J and Meyyappan M 2004 Nanotechnology 15 9-15
36. Meyyappan M 2009 J. Phys. D: Appl. Phys. 42 213001
37. Ventzek P L G, Sommerer T J, Hoekstra R J and Kushner M J 1993 Appl. Phys. Lett. 63 605-7
38. Collison W Z and Kushner M J 1996 Appl. Phys. Lett. 68 903-5
39. Kushner M J, Collison W Z, Grapperhaus M J, Holland J P and Barnes M S 1996 J. Appl. Phys. 80 1337-44
40. Grapperhaus M J and Kushner M J 1997 J. Appl. Phys. 81 569-77
41. Rauf S and Kushner M J 1997 J. Appl. Phys. 81 5966-74
42. Kinder R L and Kushner M J 2001 J. Vac. Sci. Technol. A 19 76-86
43. Kushner M J 2009 J. Phys. D: Appl. Phys. 42 194013
44. Herrebout D, Bogaerts A, Yan M, Gijbels R, Goedheer W and Vanhulsel A 2002 J. Appl. Phys. 92 2290-5
45. Deschenaux C, Affolter A, Magni D, Hollenstein C and Fayet P 1999 J. Phys. D: Appl. Phys. 32 1876-86
46. De Bleecker K, Bogaerts A and Goedheer W 2006 Phys. Rev. E 73 026405
47. Mao M, Benedikt J, Consoli A and Bogaerts A 2008 J. Phys. D: Appl. Phys. 41 225201
48. Thomson G M, Schummer Jh, James D R, Graham E, Gatland I R, Flannery M R and Mcdaniel E W 1973 J. Chem. Phys. 58 2402-11
49. Ervin K M, Ho J and Lineberger W C 1989 J. Chem. Phys. 91 5974-92
50. Hash D B and Meyyappan M 2003 J. Appl. Phys. 93 750-2
51. Naha S and Puri I K 2008 J. Phys. D: Appl. Phys. 41 065304
52. Bera K, Farouk B and Vitello P 2001 J. Phys. D: Appl. Phys. 34 1479-90
53. Jung M, Eun K Y, Baik Y J, Lee K R, Shin J K and Kim S T 2001 Thin Solid Films 398-399 150-5
54. Lee T Y, Han J H, Choi S H, Yoo J B, Park C Y, Jung T, Yu S, Yi W K, Han I T and Kim J M 2003 Diamond Relat. Mater. 12 851-5
55. Hofmann S et al 2007 Nano Lett. 7 602-8
56. Hayashi M 1979 J. Phys. (Paris) 40 45-6
57. Kline L E 1982 IEEE Trans. Plasma Sci. 10 224-33
58. Sohn W, Kochen K H, Scheuerlein K M, Jung K and Ehrhardt H 1986 J. Phys. B: At. Mol. Opt. Phys. 19 3625-32
59. Tanaka H, Kubo M, Onodera N and Suzuki A 1983 J. Phys. B: At. Mol. Opt. Phys. 16 2861-9
60. Winters H F 1975 J. Chem. Phys. 63 3462-6
61. Chatham H, Hils D, Robertson R and Gallagher A 1984 J. Chem. Phys. 81 1770-7
62. Janev R K and Reiter D 2002 FZJ Report Juel-3966
63. Janev R K and Reiter D 2002 FZJ Report Juel-4005
64. Tawara H, Itikawa Y, Nishimura H, Tanaka H and Nakamura Y 1992 Supp. Nucl. Fusion 2 41-64
65. Tian C C and Vidal C R 1998 J. Phys. B: At. Mol. Opt. Phys. 31 895-909
66. UMIST http://www.udfa.net/ - ref-separator -
67. Herrebout D, Bogaerts A, Yan M, Gijbels R, Goedheer W and Dekempeneer E 2001 J. Appl. Phys. 90 570-9
68. Morrison N A, William C and Milne W I 2003 J. Appl. Phys. 94 7031-43
69. http://physics.nist.gov/PhysRefData/Ionization/molTable.html - ref-separator -
70. Laufer A H and Fahr A 2004 Chem. Rev. 104 2813-32
71. Wang H and Frenklach M 1997 Combust. Flame 110 173-221
72. Masi M, Cavallotti C and Carra S 1998 Chem. Eng. Sci. 53 3875-86
73. Frenklach M and Warnatz J 1987 Combust. Sci. Technol. 51 265-83
74. Landera A, Krishtal S P, Kislov V V, Mebel A M and Kaiser R I 2008 J. Chem. Phys. 128 214301
75. Hayashi M 1990 Nonequilibrium Processes in Partially Ionized Gases (NATO Adv. Sci. Inst Ser. B-Phys.) vol 220 ed M Capitelli and J N Bardsley (New York: Plenum) pp 333-40
76. Hack W, Wagner H G and Zasypkin A 1994 Ber. Bunsenges. Phys. Chem. 98 156-64
77. Thielen K and Roth P 1986 AIAA J. 24 1102-5
78. Corchado J C and EspinosaGarcia J 1997 J. Chem. Phys. 106 4013-21
79. Sommerer T J and Kushner M J 1992 J. Appl. Phys. 71 1654-73
80. Rohrig M and Wagner H G 1994 Ber. Bunsenges. Phys. Chem. 98 858-63
81. Kushner M J 1992 J. Appl. Phys. 71 4173-89
82. Stothard N, Humpfer R and Grotheer H H 1995 Chem. Phys. Lett. 240 474-80
83. Xu Z F, Fang D C and Fu X Y 1998 Int. J. Quantum Chem. 70 321-9
84. Pagsberg P B, Eriksen J and Christensen H C 1979 J. Phys. Chem. 83 582-90
85. Meaburn G M and Gordon S 1968 J. Phys. Chem. 72 1592
86. Nicholas J E, Spiers A I and Martin N A 1986 Plasma Chem. Plasma Process. 6 39-51
87. Xu Z F, Fang D C and Fu X Y 1997 Chem. Phys. Lett. 275 386-91
88. Yoshimura M, Tamura F, Koshi M and Matsui H 1990 Nippon Kagaku Kaishi 589-93
89. Teng L and Winkler C A 1973 Can. J. Chem. 51 3771-3
90. Linder D P, Duan X F and Page M 1996 J. Chem. Phys. 104 6298-307
91. Gehring M, Hoyerman K, Wagner H G and Wolfrum J 1971 Ber. Bunsenges. Ges. 75 1287
92. Schiavello M and Volpi G G 1962 J. Chem. Phys. 37 1510
93. Stief L J 1970 J. Chem. Phys. 52 4841
94. Vaghjiani G L 1995 Int. J. Chem. Kinet. 27 777-90
95. Dorai R and Kushner M J 2003 J. Phys. D: Appl. Phys. 36 666-85
96. Legrand J C, Diamy A M, Hrach R and Hrachova V 1998 Vacuum 50 491-5
97. Legrand J C, Diamy A M, Hrach R and Hrachova V 1997 Vacuum 48 671-5
98. Naujoks D, Bohmeyer W, Markin A, Arkhipov I, Carl P, Koch B, Reiner H D, Schroder D and Fussmann G 2004 Phys. Scr. T111 80-5
99. Liu D P, Martin I T, Zhou J and Fisher E R 2006 Pure Appl. Chem. 78 1187-202