Predicting the amount of carbon in carbon nanotubes grown by CH 4 rf plasmas

Journal of Applied Physics

Volumn 99, Issue 1, 2006, Pages

  Okita, Atsushi ^a   Suda, Yoshiyuki ^a   Ozeki, Atsushi ^a   Sugawara, Hirotake ^a   Sakai, Yosuke ^a   Oda, Akinori ^b   Nakamura, Junji ^c  

^a HOKKAIDO UNIVERSITY   (Japan)

^b NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NONRADICAL NEUTRALS; ONE-DIMENSIONAL FLUID MODEL; SI SUBSTRATES;

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; PLASMAS; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES;

CARBON NANOTUBES;

EID: 30844435277     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2150599     Document Type: Article

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