Model based comparison of thermal and plasma chemical vapor deposition of carbon nanotubes

Journal of Applied Physics

Volumn 93, Issue 1, 2003, Pages 750-752

  Hash, D B ^a   Meyyappan, M ^a  

^a NASA AMES RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; DISSOCIATION; ELECTRONS; FREE RADICALS; LOW TEMPERATURE EFFECTS; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE REACTIONS;

PLASMA REACTORS;

CARBON NANOTUBES;

EID: 0037246598     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1525854     Document Type: Article

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