Low-temperature growth of carbon nanotubes by plasma-enhanced chemical vapor deposition

Applied Physics Letters

Volumn 83, Issue 1, 2003, Pages 135-137

  Hofmann, S ^a   Ducati, C ^a   Robertson, J ^a   Kleinsorge, B ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b CCR GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CATALYSTS; DIFFUSION; GROWTH (MATERIALS); LOW TEMPERATURE EFFECTS; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SURFACE PHENOMENA;

LOW-TEMPERATURE GROWTH;

CARBON NANOTUBES;

EID: 0041840312     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1589187     Document Type: Article

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