Modeling of a capacitively coupled radio-frequency methane plasma: Comparison between a one-dimensional and a two-dimensional fluid model

Journal of Applied Physics

Volumn 92, Issue 5, 2002, Pages 2290-2295

  Herrebout, D ^a   Bogaerts, A ^a   Yan, M ^a   Gijbels, R ^a   Goedheer, W ^b   Vanhulsel, A ^c  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^c FLEMISH INSTITUTE FOR TECHNOLOGICAL RESEARCH VITO   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AXIAL DIRECTION; CAPACITIVELY COUPLED; DEPOSITED LAYER; DIAMOND-LIKE CARBON; ELECTRODE RADII; ELECTRON ENERGIES; FLUID MODELS; METHANE PLASMA; NONUNIFORM; PLASMA REACTORS; PLASMA SPECIES; RADIAL DIRECTION; RADIO FREQUENCIES; REACTION RATE COEFFICIENTS; RF PLASMA; SECONDARY ELECTRONS; SPECIES DENSITY; TWO DIMENSIONAL FLUID MODEL;

BOLTZMANN EQUATION; ELECTRODES; METHANE; PLASMA APPLICATIONS; REACTION RATES; TWO DIMENSIONAL;

PLASMA FLOW;

EID: 0036732144     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1500789     Document Type: Article

References (15)

1. E. Gogolides, D. Mary, A. Rhaballi, and G. Turban, Jpn. J. Appl. Phys., Part 1 34, 261 (1995). jjb JAPNDE 0021-4922
2. K. Bera, B. Farouk, and Y. H. Lee, J. Electrochem. Soc. 146, 3264 (1999). jes JESOAN 0013-4651
3. D. Herrebout, A. Bogaerts, M. Yan, R. Gijbels, W. Goedheer, and E. Dekempeneer, J. Appl. Phys. 90, 570 (2001). jap JAPIAU 0021-8979
4. P. M. Meijer, W. J. Goedheer, and J. D. P. Passchier, Phys. Rev. A 45, 1098 (1992). pra PLRAAN 1050-2947
5. G. J. Nienhuis, W. J. Goedheer, E. A. G. Hamers, W. G. J. H. M. van Sark, and J. Bezemer, J. Appl. Phys. 82, 2060 (1997). jap JAPIAU 0021-8979
6. G. J. Nienhuis and W. Goedheer, Plasma Sources Sci. Technol. 8, 295 (1999). pst PSTEEU 0963-0252
7. G. J. Nienhuis, Ph.D. thesis, Utrecht University, 1998.
8. K. Bera, J. W. Yi, B. Farouk, and Y. H. Lee, IEEE Trans. Plasma Sci. 27, 5 (1999). tps ITPSBD 0093-3813
9. K. Bera, B. Farouk, and Y. H. Lee, Plasma Sources Sci. Technol. 10, 211 (2001). pst PSTEEU 0963-0252
10. K. Bera, B. Farouk, and Y. H. Lee, Plasma Sources Sci. Technol. 8, 412 (1999). pst PSTEEU 0963-0252
11. K. Nagayama, B. Farouk, and Y. H. Lee, IEEE Trans. Plasma Sci. 26, 125 (1998). tps ITPSBD 0093-3813
12. E. Gogolides and H. Sawin, J. Appl. Phys. 72, 3971 (1992). jap JAPIAU 0021-8979
13. J. D. P. Passchier, Ph.D. thesis, Utrecht University, 1994.
14. J. D. P. Passchier and W. J. Goedheer, J. Appl. Phys. 74, 3744 (1993). jap JAPIAU 0021-8979
15. D. L. Sharfetter and H. K. Gummel, IEEE Trans. Electron Devices ED-16, 64 (1969). etd IETDAI 0018-9383