Characterization and optimization of dry releasing for the fabrication of RF MEMS capacitive switches

Journal of Micromechanics and Microengineering

Volumn 17, Issue 10, 2007, Pages 2024-2030

  Yu, A B ^a   Liu, A Q ^b   Oberhammer, J ^b   Zhang, Q X ^c   Hosseini, H M ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DRY ETCHING; LITHOGRAPHY; MEMS; OPTIMIZATION; PHOTORESISTS;

DRY RELEASING; ETCHING PARAMETERS; MECHANICAL FRACTURE; MECHANICAL PERFORMANCE;

SWITCHES;

EID: 34748834259     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/10/014     Document Type: Article

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