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Volumn 26, Issue 2, 2008, Pages 481-486
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Fabrication process for cantilevers with integrated tunnel junctions
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Author keywords
[No Author keywords available]
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Indexed keywords
CLAMPED BEAMS;
ELECTRON-BEAM DEPOSITION SOURCE;
INTEGRATED ELECTRICAL LEADS;
ELECTRIC PROPERTIES;
ELECTRON BEAM LITHOGRAPHY;
POLYIMIDES;
TUNNEL JUNCTIONS;
ELECTRON BEAMS;
LITHOGRAPHY;
POLYAMIDES;
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EID: 41549161158
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.2836428 Document Type: Article |
Times cited : (2)
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References (14)
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