메뉴 건너뛰기




Volumn 26, Issue 2, 2008, Pages 481-486

Fabrication process for cantilevers with integrated tunnel junctions

Author keywords

[No Author keywords available]

Indexed keywords

CLAMPED BEAMS; ELECTRON-BEAM DEPOSITION SOURCE; INTEGRATED ELECTRICAL LEADS;

EID: 41549161158     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2836428     Document Type: Article
Times cited : (2)

References (14)
  • 6
    • 41549156239 scopus 로고    scopus 로고
    • 1254 Chestnut Street, Newton, MA 02464, www.microchem.com.
    • 1254 Chestnut Street, Newton, MA 02464, www.microchem.com, 2007.
    • (2007)
  • 7
    • 41549111774 scopus 로고    scopus 로고
    • Foundations of Nanomechanics (Springer, Berlin).
    • A. N. Cleland, Foundations of Nanomechanics (Springer, Berlin, 2003).
    • (2003)
    • Cleland, A.N.1
  • 8
    • 0034314806 scopus 로고    scopus 로고
    • 1071-1023 10.1116/1.1313583.
    • H. Namatsu, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1313583 18, 3308 (2000).
    • (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 3308
    • Namatsu, H.1
  • 12
    • 41549156238 scopus 로고
    • Formulas for Stress and Strain (McGraw-Hill, New York).
    • R. J. Roark and W. C. Young, Formulas for Stress and Strain (McGraw-Hill, New York, 1975).
    • (1975)
    • Roark, R.J.1    Young, W.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.