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Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2008, Pages 387-390

Atomic layer deposited alumina for micromachined resonators

(3) Chang, Y J a Cobry, K a Bright, V M a

a UCB 450 (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; ATOMS; COMPOSITE MICROMECHANICS; MECHANICAL ENGINEERING; MECHANICS; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; REACTIVE ION ETCHING;

ATOMIC-LAYER-DEPOSITED; INTERNATIONAL CONFERENCES; MICRO-ELECTRO MECHANICAL SYSTEMS; MICROMACHINED;

ORE TREATMENT;

EID: 50149105228 PISSN: 10846999 EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/MEMSYS.2008.4443674 Document Type: Conference Paper

Times cited : (8)

References (8)

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