Surface characteristics of (100) silicon anisotropically etched in aqueous KOH

Journal of the Electrochemical Society

Volumn 143, Issue 4, 1996, Pages 1372-1375

  Vu, Quoc Bao ^a   Stricker, David A ^a,b   Zavracky, Paul M ^a  

^a NORTHEASTERN UNIVERSITY   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; BUBBLES (IN FLUIDS); ETCHING; HYDROGEN; MICROMACHINING; POTASSIUM COMPOUNDS; SILICON WAFERS; SOLUTIONS; SURFACE PROPERTIES; SURFACE ROUGHNESS;

POTASSIUM HYDROXIDES; SURFACE PREPARATION; WAFER ROTATION;

SEMICONDUCTING SILICON;

EID: 0030127884     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836644     Document Type: Article

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