Micromachined resonators of high Q-factor based on atomic layer deposited alumina

Sensors and Actuators, A: Physical

Volumn 154, Issue 2, 2009, Pages 229-237

  Chang, Yuan Jen ^a   Gray, Jason M ^b   Imtiaz, Atif ^c   Seghete, Dragos ^b   Mitch Wallis, T ^c   George, Steven M ^b   Kabos, Pavel ^c   Rogers, Charles T ^b   Bright, Victor M ^a  

^a University of Colorado at Boulder   (United States)

^b UNIVERSITY OF COLORADO   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

AFM; Alumina; Atomic layer deposition; Micro resonator; Resonant frequency; SEM

Indexed keywords

AFM; ALUMINA MATERIALS; ATOMIC FORCE MICROSCOPES; ATOMIC LAYER DEPOSITED; AXIAL STRESS; CALCULATED VALUES; DIFFERENT MODES; DRY ETCHING PROCESS; ELECTROSTATIC LOAD; HIGH Q FACTOR; MEASURED DATA; MICRO RESONATORS; MICRO-BRIDGE; MICRO-RESONATOR; MICROMACHINED; OPTICAL INTERFEROMETER; PINNED-PINNED BEAMS; QUALITY FACTORS; RESONANT FREQUENCIES; RESONANT FREQUENCY; RESONATOR MODEL; SCANNING ELECTRON MICROSCOPES; SEM; SIZE REDUCTIONS; STATIC DISPLACEMENT; STRUCTURAL MATERIALS;

ALUMINA; ATOMIC FORCE MICROSCOPY; ATOMS; BUILDING MATERIALS; CHROMIUM; CRYSTAL RESONATORS; ELECTROSTATIC ACTUATORS; MICROSCOPES; NATURAL FREQUENCIES; Q FACTOR MEASUREMENT; SCANNING ELECTRON MICROSCOPY;

MICROELECTROMECHANICAL DEVICES;

EID: 69549110417     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2008.11.015     Document Type: Article

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