Nanoscale etching of resists in view of a mechanistic framework

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 75-78

  Van Delft, Falco C M J M ^a   Giesbers, J Ben ^a   Nienhuis, Gert Jan ^a,b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISORPTION; ELECTRON BEAMS; NANOTECHNOLOGY; OXYGEN; PHOTORESISTS; REACTIVE ION ETCHING; TEMPERATURE; THIN FILMS;

ETCH RATE; NANOSCALE ETCHING;

PLASMA ETCHING;

EID: 0031074104     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00155-4     Document Type: Article

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