Surface technology for automotive engineering

CIRP Annals - Manufacturing Technology

Volumn 58, Issue 2, 2009, Pages 608-627

  Bewilogua, K ^a   Brauer G ^a   Dietz, A ^a   Gabler J ^a   Goch, G ^b   Karpuschewski, B ^c   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b UNIVERSITY OF BREMEN   (Germany)

^c OTTO VON GUERICKE UNIVERSITY   (Germany)

Author keywords

Chemical vapour deposition (CVD); Coating; Physical vapour deposition (PVD)

Indexed keywords

AUTOMOTIVE GLAZING; CHEMICAL VAPOUR DEPOSITION; CHEMICAL VAPOUR DEPOSITION (CVD); DEPOSITION PROCESS; DEVELOPMENT TASKS; ELECTROCHEMICAL DEPOSITION; HIGH HARDNESS; LOW COEFFICIENT OF FRICTION; LOW PRESSURE PLASMA; LOW PRESSURES; MANUFACTURING PROCESS; OPTICAL AND THERMAL PROPERTIES; PHYSICAL VAPOUR DEPOSITION; POWERTRAIN COMPONENTS; SELF-HEALING; SURFACE TECHNOLOGY; SWITCHABLE; THIN FILM SOLAR CELLS;

ATMOSPHERIC PRESSURE; AUTOMOTIVE ENGINEERING; AUTOMOTIVE INDUSTRY; CARBON FILMS; DEPOSITION; DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; HARD COATINGS; NITRIDES; OPTICAL PROPERTIES; PLASMA DEPOSITION; REDUCTION; THERMODYNAMIC PROPERTIES;

CHEMICAL VAPOR DEPOSITION;

EID: 70449699630     PISSN: 00078506     EISSN: 17260604     Source Type: Journal    
DOI: 10.1016/j.cirp.2009.09.001     Document Type: Article

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