Determination of the short wavelength cutoff of interferential and confocal microscopes

Wear

Volumn 264, Issue 5-6, 2008, Pages 439-443

  Krüger Sehm, Rolf ^a   Frühauf, Joachim ^b   Dziomba, Thorsten ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

AFM; Confocal microscope; Interference microscope; Short wavelength cutoff

Indexed keywords

ATOMIC FORCE MICROSCOPY; BANDWIDTH; PARAMETER ESTIMATION; STANDARDS;

CONFOCAL MICROSCOPE; INTERFERENCE MICROSCOPE; SHORT WAVELENGTH CUTOFF;

MEASUREMENT THEORY;

ATOMIC FORCE MICROSCOPY; BANDWIDTH; MEASUREMENT THEORY; PARAMETER ESTIMATION; STANDARDS;

EID: 37449011583     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.wear.2006.08.038     Document Type: Article

References (5)

1. DIN EN ISO 3274, International Organisation of Standardisation ISO, Geometrical Product Specification (GPS) Surface Texture: Profile Method; Nominal Characteristics of Contact Stylus Instruments, 1996.
2. Hecht E. Optics. 3rd ed. (1998), Oldenbourg Verlag, München (sect. 10.2)
3. Frühauf J., Krönert S., and Brand U. Tiefen- und Längennormale aus Silizium. Technisches Messen 68 7/8 (2001) 326-332
4. DIN EN ISO 5436-1, International Organisation of Standardisation ISO, Geometrical Product Specification (GPS) Surface texture. Measurement Standards. Part 1. Material Measures, 1998.
5. VDI 2655-1 Blatt 1.1 draft (bilingual), Optische Messtechnik an Mikrotopographien: Kalibrieren von Interferenzmikroskopen und Tiefeneinstellnormalen für die Rauheitsmessung; Optical Measurement and Microtopographies: Calibration of Interference Microscopes and Depth Measurement Standards for Roughness Measurement, 2005.