Residual stress analysis of thin films and coatings through XRD 2 experiments

Thin Solid Films

Volumn 450, Issue 1, 2004, Pages 143-147

  Gelfi, M ^a   Bontempi, E ^a   Roberti, R ^a   Armelao, L ^b   Depero, L E ^a  

^a UNIVERSITY OF BRESCIA   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

Author keywords

GIXRD; Phase transition; Residual stress; Thin film; XRD; XRD2

Indexed keywords

ABANDONED MINES; ADHESION; CRACK INITIATION; CRYSTALLINE MATERIALS; DEPOSITION; DIFFRACTOMETERS; IMAGE ANALYSIS; LANTHANUM COMPOUNDS; PHASE TRANSITIONS; PROTECTIVE COATINGS; RESIDUAL STRESSES; STEADY FLOW; STRAIN; SURFACE PHENOMENA; X RAY DIFFRACTION;

CRACKING RESISTANCE; GLANCING INCIDENCE X-RAY DIFFRACTION (GIXRD); X-RAY REFLECTIVITY (XRR);

THIN FILMS;

EID: 1142267511     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.10.059     Document Type: Conference Paper

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