Process dependence of roughness in a positive-tone chemically amplified resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3748-3751

  He, D ^a   Cerrina, F ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000863425     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590401     Document Type: Article

References (6)

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2. Y. Zhu, Center for X-ray Lithography (private communication, 1996).
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4. A. L. Barabasi and H. E. Stanley, Fractal Concepts in Surface Growth (Cambridge University Press, New York, 1995), p. 36.
5. H.-O. Peitgen and D. Saupe, The Science of Fractal Images (Barnsley, New York, 1988).
6. M. Nagase, H. Namatsu, K. Iwadate, K. Murase, and T. Makino, Microelectron. Eng. 30, 419 (1996).