Photons, electrons, and acid yields in EUV photoresists: A progress report

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Brainard, Robert ^a   Hassanein, Elsayed ^a   Li, Juntao ^a   Pathak, Piyush ^b   Thiel, Brad ^a   Cerrina, Franco ^b   Moore, Richard ^a   Rodriguez, Miguel ^a   Yakshinskiy, Boris ^d   Loginova, Elena ^d   Madey, Theodore ^d   Matyi, Richard ^a   Malloy, Matt ^c   Rudack, Andrew ^c   Naulleau, Patrick ^a   Wüest, Andrea ^c   Dean, Kim ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

^c SEMATECH   (United States)

^d RUTGERS UNIVERSITY   (United States)

Author keywords

EELS; EUV Resists; Mechanism; Monte carlo; PAGs; Photoacid generators; Photoelectrons; Quantum yield

Indexed keywords

EELS; EUV RESISTS; MONTE CARLO; PAGS; PHOTOACID GENERATORS;

LIGHT WATER REACTORS; PHOTOIONIZATION; PHOTONS; PHOTORESISTORS; ROUGHNESS MEASUREMENT; SCHEDULING;

ULTRAVIOLET DEVICES;

EID: 57349163181     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773869     Document Type: Conference Paper

References (38)

1. Resist performance has been named one of the three most critical barriers to successful implementation of EUV lithography during the last four annual EUV Lithography Symposiums (2004-2007).
2. Brainard, Robert L.; Trefonas, Peter; Lammers, Jeroen H.; Cutler, Charlotte A.; Mackevich, Joseph F.; Trefonas, Alexander; Robertson, Stewart A. Shot noise, LER, and quantum efficiency of EUV photoresists. Proceedings of SPIE-The International Society for Optical Engineering (2004), 5374(Pt. 1), 74-85.
3. Peter Zandbergen, EXCITE, the MEDEA+ Extreme UV Consortium for Imaging Technology, Paper 1-ET-14; International EUV symposium, San Diego, November 7-9, 2005.
4. Cobb, Jonathan L.; Brainard, Robert L.; O'Connell, Donna J.; Dentinger, Paul M. EUV lithography: patterning to the end of the road. Materials Research Society Symposium Proceedings (2002), 705 (Nanopatterning: From Ultralarge-Scale Integration to Biotechnology), 91-100.
5. Cutler, Charlotte A.; Mackevich, Joseph F.; Li, Jieming; O'Connell, Donna J.; Cardinale, Gregory F.; Brainard, Robert L. Effect of polymer molecular weight on AFM polymer aggregate size and LER of EUV resists. Proceedings of SPIE-The International Society for Optical Engineering (2003), 5037(Pt. 1, Emerging Lithographic Technologies VII), 406-417.
6. Steenwinckel, David Van; Lammers, Jeroen H.; Koehler, Thomas; Brainard, Robert L.; Trefonas, Peter; Resist Effects at Small Pitches, accepted to EIPBN 2005.
7. Koehler, Thomas; Brainard, Robert L.; Naulleau, Patrick P.; Lammers, Jeroen H.; Steenwinckel, David Van; Goldberg, Kenneth A.; Mackevich, Joseph F.; Trefonas, Peter; Performance of EUV Photoresists on the ALS Micro Exposure Tool, 3rd International EUVL Symposium in Miyazaki, Japan 2004.
8. Gallatin, Gregg M.; Naulleau, Patrick; Brainard, Robert. Fundamental limits to EUV photoresist. Proceedings of SPIE (2007), 6519, 651911/1-651911/10.
9. Pappas, S. Peter; Pappas, Betty C.; Gatechair, Leslie R.; Schnabel, Wolfram. Photoinitiation of cationic polymerization. II. Laser flash photolysis of diphenyliodonium salts. Journal of Polymer Science, Polymer Chemistry Edition (1984), 22(1), 69-76.
10. Dektar, John L.; Hacker, Nigel P. Photochemistry of triarylsulfonium salts. Journal of the American Chemical Society (1990), 112(16), 6004-15;
11. Dektar, John L.; Hacker, Nigel P. Photochemistry of diaryliodonium salts. Journal of Organic Chemistry (1990), 55(2), 639-47.
12. Cameron, James F.; Chan, Nicholas; Moore, Kathryn; Pohlers, Gerd. Comparison of acid-generating efficiencies in 248 and 193-nm photoresists. Proceedings of SPIE-The International Society for Optical Engineering (2001), 4345(Pt. 1, Advances in Resist Technology and Processing XVIII), 106-118.
13. Hacker, Nigel P.; Hofer, Donald C.; Welsh, Kevin M. Photochemical and photophysical studies on chemically amplified resists. Journal of Photopolymer Science and Technology (1992), 5(1), 35-46;
14. Welsh, Kevin M.; Dektar, John L.; Garcia-Garibaya, Miguel A.; Hacker, Nigel P.; Turro, N. J. Photo-CIDNP and nanosecond laser flash photolysis studies on the photodecomposition of triarylsulfonium salts. Journal of Organic Chemistry (1992), 57(15), 4179-84.
15. Brainard, Robert L.; Henderson, Craig; Cobb, Jonathan; Rao, Veena; Mackevich, Joseph F.; Okoroanyanwu, Uzodinma; Gunn, Scott; Chambers, Janet; Connolly, Susan. Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures (1999), 17(6), 3384-3389.
16. Brainard, Robert L.; Barclay, George G.; Anderson, Erik H.; Ocola, Leonidas E. Resists for next generation lithography. Microelectronic Engineering (2002), 61-62 707-715.
17. Kozawa, Takahiro; Tagawa, Seiichi. Basic aspects of acid generation processes in chemically amplified resists for electron beam lithography. Proceedings of SPIE-The International Society for Optical Engineering (2005), 5753(Pt. 1, Advances in Resist Technology and Processing XXII), 361-367.
18. Kozawa, Takahiro; Tagawa, Seiichi. Basic aspects of acid generation processes in chemically amplified electron beam resist. Journal of Photopolymer Science and Technology (2005), 18(4), 471-474.
19. Tagawa, Seiichi; Nagahara, Seiji; Iwamoto, Toshiyuki; Wakita, Masanori; Kozawa, Takahiro; Yamamoto, Yukio; Werst, David; Trifunac, Alexander D. Radiation and photochemistry of onium salt acid generators in chemically amplified resists. Proceedings of SPIE-The International Society for Optical Engineering (2000), 3999(Pt. 1, Advances in Resist Technology and Processing XVII), 204-213
20. Nakano, Atsuro; Okamoto, Kazumasa; Yamamoto, Yukio; Kozawa, Takahiro; Tagawa, Seiichi; Kai, Toshiyuki; Nemoto, Hiroaki; Shimokawa, Tsutomu. Deprotonation mechanism of poly(4-hydroxystyrene) and its derivative. Proceedings of SPIE-The International Society for Optical Engineering (2005), 5753(Pt. 2, Advances in Resist Technology and Processing XXII), 1034-1039.
21. Kozawa, Takahiro; Saeki, Akinori; Tagawa, Seiichi. Modeling and simulation of chemically amplified electron beam, x-ray, and EUV resist processes. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures-Processing, Measurement, and Phenomena (2004), 22(6), 3489-3492.
22. Yamamoto, Hiroki; Kozawa, Takahiro; Nakano, Atsuro; Okamoto, Kazumasa; Tagawa, Seiichi; Ando, Tomoyuki; Sato, Mitsuru; Komano, Hiroji. Dependence of acid generation efficiency on the protection ratio of hydroxyl groups in chemically amplified electron beam, x-ray and EUV resists. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures-Processing, Measurement, and Phenomena (2004), 22(6), 3522-3524.
23. Kozawa, Takahiro; Saeki, Akinori; Nakano, Atsuro; Yoshida, Yoichi; Tagawa, Seiichi. Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures-Processing, Measurement, and Phenomena (2003), 21(6), 3149-3152.
24. Ocola, Leonidas E. Electron-matter interactions in X-ray and electron lithography. Ph.D. Thesis, University of Wisconsin - Madison (1996).
25. Han, Geng; Khan, Mumit; Fang, Yanghua; Cerrina, Franco. Comprehensive model of electron energy deposition. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures (2002), 20(6), 2666-2671.
26. Han, Geng; Khan, Mumit; Cerrina, Franco. Stochastic modeling of high energy lithographies. Journal of Vacuum Science & Technology, B: Microelectronics and Nanometer Structures (2003), 21(6), 3166-3171.
27. Robertson, Stewart A.; Naulleau, Patrick P.; O'Connell, Donna J.; McDonald, Kevin; Delano, Todd M.; Goldberg, Kenneth A.; Hansen, Steven G.; Brown, Kirk W.; Brainard, Robert L. Calibration of EUV-2D photoresist simulation parameters for accurate predictive modeling. Proceedings of SPIE-The International Society for Optical Engineering (2003), 5037(Pt. 2, Emerging Lithographic Technologies VII), 900-909.
28. Chen, Y.F., Derivation of inelastic-electron-scattering cross sections from quantitative analysis of reflection-electron-energy-loss spectra, Phys. Rev. B 58, 8987-8096 (1998).
29. Roberts, Jeanette M.; Meagley, Robert; Fedynyshyn, Theodore H.; Sinta, Roger F.; Astolfi, David K.; Goodman, Russell B.; Cabral, Alberto. Contributions to innate material roughness in resist. Proceedings of SPIE (2006), 6153, 61533U/1-61533U/11.
30. Theodore H. Fedynyshyn, David K. Astolfi, Alberto Cabral, and Jeanette Roberts PAG segregation during exposure affecting innate material roughness Proc. SPIE Vol. 6519, 65190X.
31. Woodward, John T.; Fedynyshyn, Theodore H.; Astolfi, David K.; Cann, Susan; Roberts, Jeanette M.; Leeson, Michael J. Component segregation in model chemically amplified resists. Proceedings of SPIE (2007), 6519, 651915/1 -651915/8.
32. Fedynyshyn, Theodore H.; Pottebaum, Indira; Cabral, Alberto; Roberts, Jeanette, Changes in resist glass transition temperatures due to exposure, Proceedings of SPIE (2007), 6519, 651917/1-651917/12.
33. Hassanein, E.; Higgins, C.; Naulleau, P.; Matyi, R.; Gallatin,G.; Anderson, C.; Niakoula, D.; Denbeaux, G.; Antohe, A.; Thackeray, J.; Spear, K.; Malloy, M.; Khurshid, A.; Montgomery, C.; Piscani, E.; Rudack, A.; Byers, J.; Dean, K.; Brainard, R.; Quantum Yield, Contrast Curves and Optical Density of EUV and 193i Photoresists, Proceedings of SPIE (2008).
34. Szmanda, Charles R.; Brainard, Robert L.; Mackevich, Joseph F.; Awaji, Akira; Tanaka, Tsutomu; Yamada, Yutaka; Bohland, John; Tedesco, Serge; Dal'Zotto, Bernard; Bruenger, Wilhelm; Torkler, Michael; Fallmann, Wolfgang; Loeschner, Hans; Kaesmaier, Rainer; Nealey, Paul M.; Pawloski, Adam R. Measuring acid generation efficiency in chemically amplified resists with all three beams. J. Vac. Sci. Tech., B: (1999), 17(6), 3356-3361.
35. Theodore E. Madey, B. V. Yakshinskiy, E. Loginova, L. Sanche, P. Cloutier, "Electrons in EUV Resist Activation", to be published (2008)
36. B. V. Yakshinskiy, R. Wasielewski, E. Loginova and T. E. Madey, "Carbon accumulation and mitigation processes, and secondary electron yields of ruthenium surfaces", Proc. SPIE 6517, 65172Z (2007).
37. B. V. Yakshinskiy, R. Wasielewski, E. Loginova, M. N. Hedhili, and T. E. Madey, "DIET processes on ruthenium surfaces related to extreme ultraviolet lithography" Surface Science (2008), in press.
38. M. N. Hedhili, P. Cloutier, A. D. Bass, T. E. Madey and L. Sanche, "Electron stimulated desorption of anionic fragments from films of pure and electron-irradiated thiophene", J. Chem. Phys. 125, 1-12 (2006).