EUV resist outgassing release characterization and analysis

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 479-482

  Kobayashi, Shinji ^a   Santillan, Julius Joseph ^a   Oizumi, Hiroaki ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Compensation; GC MS method; Pressure rise method; Resist outgassing

Indexed keywords

CHEMICAL COMPOSITIONS; COMPENSATION; EUV RESISTS; EVALUATION METHODS; EXPOSURE TOOLS; EXTREME ULTRA VIOLETS; GC-MS METHOD; ION GAUGES; MASS SPECTROSCOPIES; OUTGASSING QUANTIFICATIONS; PHOTO-ACID GENERATORS; PRESSURE RISE METHOD; PRESSURE VARIATIONS; QUANTIFICATION METHODS; RELATIVE SENSITIVITIES; RESIST OUTGASSING;

CHROMATOGRAPHIC ANALYSIS; DESORPTION; EXTREME ULTRAVIOLET LITHOGRAPHY; GAS CHROMATOGRAPHY; MASS SPECTROMETRY; ULTRAVIOLET DEVICES;

DEGASSING;

EID: 67349283813     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.062     Document Type: Article

References (9)

1. Y. Horiike, Presented at the Sixth International EUV Symposium, 28-31 October 2007, Sapporo, Japan.
2. Santillan J.J., Kobayashi S., and Itani T. Jpn. J. Appl. Phys. 47 6 (2008) 4922-4925
3. Kobayashi S., Santillan J.J., and Itani T. Proc. SPIE 6923 (2008) 692345-1
4. Santillan J.J., Kobayashi S., and Itani T. Proc. SPIE 6923 (2008) 692342-1
5. Santillan J.J., Toriumi M., and Itani T. Proc. SPIE 6519 (2007) 651944-1
6. Kobayashi S., Santillan J.J., and Itani T. J. Photopolym. Sci. Technol. 21 (2008) 469
7. Dean K., Nishiyama I., Oizumi H., Keen A., Cao H., Yueh W., Watanabe T., Lacovig P., Rumiz L., Denbeaux G., and Simon J. Proc. SPIE 6519 (2007) 65191P-1
8. H. Ito, C.G. Willson, J.M.J. Fréchet, Digest of Technical Papers of 1982 Symposium on VLSI Technology, 1982, p. 86.
9. Nakao F. Vacuum 25 (1975) 431