Current benchmarking results of EUV resist at Selete

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7140, Issue , 2008, Pages

  Kawamura, Daisuke ^a   Kaneyama, Koji ^a   Kobayashi, Shinji ^a   Oizumi, Hiroaki ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Benchmarking; EUV resist; LWR; Resolution; Sensitivity

Indexed keywords

EUV RESIST; HIGH RESOLUTIONS; HIGH SENSITIVITIES; LINE-WIDTH ROUGHNESS; LWR; RESIST BLURS; RESOLUTION; SENSITIVITY; TARGET VALUES;

BENCHMARKING; ULTRAVIOLET DEVICES;

ROUGHNESS MEASUREMENT;

EID: 62449234696     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.804665     Document Type: Conference Paper

References (14)

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