Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Wang, Mingxing ^a   Lee, Cheng Tsung ^b   Henderson, Clifford L ^b   Yueh, Wang ^c   Roberts, Jeanette M ^c   Gonsalves, Kenneth E ^a  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b Georgia Institute of Technology   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Anionic photoacid generators; e beam; EUV; LER; Polymer resistst

Indexed keywords

ACIDS; BENZENE; PHOTORESISTS; POLYMERS; ROUGHNESS MEASUREMENT; ULTRAVIOLET DEVICES;

ACID GENERATION EFFICIENCIES; ADAMANTYL METHACRYLATES; ANIONIC PHOTOACID GENERATORS; DEEP ULTRAVIOLETS; E-BEAM; EUV; EUV LITHOGRAPHIES; HYDROXYSTYRENE; LER; NEW SERIES; PHOTOACID GENERATORS; POLYMER RESISTS; POLYMERIC RESISTS; SUBSTITUTED BENZENES;

PHOTORESISTORS;

EID: 57349126369     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.769004     Document Type: Conference Paper

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