Basic aspects of acid generation processes in chemically amplified resists for electron beam lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 361-367

  Kozawa, Takahiro ^a   Tagawa, Seiichi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Acid distribution; Chemically amplified resist; Low energy electron; Resolution; Sensitivity

Indexed keywords

ACIDS; ELECTRONS; IONIZATION OF LIQUIDS; NEGATIVE IONS; PERMITTIVITY; PHOTORESISTS; POLYMERS; POSITIVE IONS; PROTONS; SENSITIVITY ANALYSIS;

ACID DISTRIBUTION; CHEMICALLY AMPLIFIED RESISTS; LOW ENERGY ELECTRONS; RESOLUTION; SENSITIVITY;

ELECTRON BEAM LITHOGRAPHY;

EID: 24644511335     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600150     Document Type: Conference Paper

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