SEMATECH's EUV program: A key enabler for EUVL introduction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 1, 2007, Pages

  Wurm, Stefan ^a   Jeon, Chan Uk ^a   Lercel, Michael ^a  

^a SEMATECH   (United States)

Author keywords

EUV infrastructure; Extreme ultraviolet lithography

Indexed keywords

INTEGRATED OPTICS; TECHNOLOGY TRANSFER; ULTRAVIOLET RADIATION;

BUSINESS CHALLENGES; EUV INFRASTRUCTURE; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148879630     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.717756     Document Type: Conference Paper

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