The effect of EUV molecular glass architecture on the bulk dispersion of a photo-acid generator

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Vanderhart, David L ^a   De Silva, Anuja ^b   Felix, Nelson ^c   Prabhu, Vivek M ^a   Ober, Christopher K ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Department of Molecular Biology and Genetics   (United States)

^c School of Chemical and Molecular Engineering   (United States)

Author keywords

Crystallinity; Hydrogen bonding; Impurities; Mixing; Molecular glass; N metliyl 2 pyrrolidinone; NMR; Photoacid generator; Photoresist; Spin diffusion

Indexed keywords

CRYSTALLINITY; HYDROGEN BONDING; MOLECULAR GLASS; N-METLIYL 2-PYRROLIDINONE; NMR; PHOTOACID GENERATOR; SPIN DIFFUSION;

BONDING; CRYSTALLINE MATERIALS; ELECTRIC EQUIPMENT PROTECTION; GLASS; GLASS BONDING; HYDROGEN; HYDROGEN BONDS; ISOMERS; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHASE SEPARATION; PHOTORESISTORS; PROTONS; SEMICONDUCTOR DOPING; SOLVENTS; SPIN DYNAMICS; SPIN GLASS; SURFACE TREATMENT; ULTRAVIOLET DEVICES;

IMPURITIES;

EID: 57349175976     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.773048     Document Type: Conference Paper

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