EUV resist development in selete

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Kawamura, Daisuke ^a   Kaneyama, Koji ^a   Kobayashi, Shinji ^a   Santillan, Julius Joseph ^a   Itani, Toshiro ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

EUV resist; Illumination shape; Resist blur; SFET

Indexed keywords

EXPOSURE METERS; LIGHT WATER REACTORS; ROUGHNESS MEASUREMENT;

ANNULAR ILLUMINATIONS; CURRENT STATUSES; EUV RESIST; EUV RESISTS; EXPOSURE TOOLS; FIELD EXPOSURES; GAUSSIAN; HIGH RESOLUTIONS; HIGH SENSITIVITIES; ILLUMINATION SHAPE; LINE WIDTHS; RESIST BLUR; RESIST BLURS; SFET;

ULTRAVIOLET DEVICES;

EID: 57349120614     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771858     Document Type: Conference Paper

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