PAG segregation during exposure affecting innate material roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 1, 2007, Pages

  Fedynyshyn, Theodore H ^a   Astolfi, David K ^a   Cabral, Alberto ^a   Roberts, Jeanette ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Linewidth roughness; PAG; Photoresist; Polymer

Indexed keywords

INNATE MATERIAL ROUGHNESS; INTRINSIC MATERIAL ROUGHNESS (IMR); LINEWIDTH ROUGHNESS; PAG SEGREGATION;

CONDUCTING POLYMERS; DISSOLUTION; FILMS; IMAGE PROCESSING; SURFACE ROUGHNESS;

PHOTORESISTS;

EID: 35148835285     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.713892     Document Type: Conference Paper

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