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Journal of Photopolymer Science and Technology

Volumn 18, Issue 4, 2005, Pages 471-474

Basic aspects of acid generation processes in chemically amplified electron beam resist

(2) Kozawa, Takahiro a Tagawa, Seiichi a

a OSAKA UNIVERSITY (Japan)

Author keywords

Chemically amplified resist; Low energy electron; Resolution; Sensitivity

Indexed keywords

EID: 22144475466 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.18.471 Document Type: Article

Times cited : (17)

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