Chemical and physical sputtering effects on the surface morphology of carbon films grown by plasma chemical vapor deposition

Journal of Applied Physics

Volumn 106, Issue 3, 2009, Pages

  Vázquez, Luis ^a   Buijnsters, Josephus G ^b  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

A-C:H FILMS; CHEMICAL EROSION; CHEMICAL SPUTTERING; ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION; FILM MORPHOLOGY; FILM SURFACES; HYDROGENATED CARBON FILMS; PHYSICAL SPUTTERING; PHYSICAL SPUTTERING PROCESS; PLASMA CHEMICAL VAPOR DEPOSITION; POWER SPECTRUM DENSITY; REACTIVE NITROGEN SPECIES; ROUGHNESS ANALYSIS; SILICON SUBSTRATES; SPATIAL CORRELATIONS; SUBSTRATE BIAS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CARBON FILMS; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; CYCLOTRONS; FILM GROWTH; MOLECULAR BEAM EPITAXY; MORPHOLOGY; PLASMA DEPOSITION; POWER SPECTRAL DENSITY; POWER SPECTRUM; PULSE SHAPING CIRCUITS; SUBSTRATES; SURFACE CHEMISTRY; SURFACE ROUGHNESS; VAPORS;

SURFACE MORPHOLOGY;

EID: 69149085621     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3184349     Document Type: Article

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