Surface modifications in amorphous carbon films exposed to nitrogen plasma

Diamond and Related Materials

Volumn 16, Issue 4-7 SPEC. ISS., 2007, Pages 1282-1285

  Freire Jr , F L ^a   Castaneda S I ^a   Prioli, R ^a  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

AFM; Amorphous carbon; Plasma; Surface roughness

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; NITROGEN; PLASMAS; SURFACE ROUGHNESS; SURFACE TREATMENT;

AMORPHOUS CARBON FILMS; NITROGEN PLASMA; OXYGEN CONTAMINATION;

CARBON FILMS;

EID: 34047258017     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.11.026     Document Type: Article

References (22)

1. Robertson J. Mater. Sci. Eng., R Rep. 37 (2002) 129
2. Lifshitz Y., Kasi S.R., and Rabalais J.W. Phys. Rev. Lett. 62 (1989) 1290
3. Lacerda R.G., Marques F.C., and Freire Jr. F.L. Diamond Relat. Mater. 8 (1999) 495
4. Freire Jr. F.L. In: Messina G., and Santangelo S. (Eds). Carbon, the Future Material for Advanced Technology Applications (2006), Springer Verlag, Berlin
5. Roth J.R. Industrial Plasma Engineering. Applications to Nonthermal Plasma Processing vol. 2 (2001), Institute of Physics Publishing, Bristol
6. Lee K.-Y., Ryu J.-T., Fujimoto K., Honda S.-I., Katayama M., Hirao T., and Oura K. J. Vac. Sci. Technol., B 19 (2001) 1953
7. Hong J., Granier A., Goullet A., and Turban G. Diamond Relat. Mater. 9 (2000) 573
8. Jacob W., Hopf C., and Schlüter M. Appl. Phys. Lett. 86 (2005) 204130
9. Castañeda S.I., Espinoza V.A.A., Freire Jr. F.L., Franceschini D.F., and Jacobsohn L.G. Nucl. Instrum. Methods B 175-177 (2001) 699
10. Freire Jr. F.L., Franceschini D.F., and Achete C.A. Nucl. Instrum. Methods B 85 (1994) 268
11. Jacobsohn L.G., Capote G., Cruz N.C., Zanatta A.R., and Freire Jr. F.L. Thin Solid Films 419 (2002) 46
12. Gustafsson T., Lu H.C., Busch B.W., Schulte W.H., and Garfunkel E. Nucl. Instrum. Methods B 183 (2001) 146
13. Wild C., and Koild P. J. Appl. Phys. 69 (1991) 2909
14. Zeuner M., Neuman H., and Meichsner J. J. Appl. Phys. 81 (1997) 2985
15. Hammer P., Baker M.A., Lenardi C., and Gissler W. Thin Solid Films 290-291 (1996) 107
16. Gusev E.P., Lu H.C., Gustafsson T., and Garfunkel E. Phys. Rev. B 52 (1995) 1759
17. Aarão Reis F.D.A., and Franceschini D.F. Phys. Rev. E: Stat. Phys., Plasmas, Fluids, Relat. Interdiscip. Top. 61 (2000) 3417
18. Maia da Costa M.E.H., Sanchez C.M.T., Jacobsohn L.G., and Freire Jr. F.L. Thin Solid Films 482 (2005) 109
19. Sanchez-Lopez J.C., Donnet C., Lefèbvre F., C-Fernández-Ramos, and Fernández A. J. Appl. Phys. 90 (2001) 675
20. Helgren N., Guo J., Sathe C., Agui A., Nordgren J., Luo Y., Agren H., and Sundgren J.-E. Appl. Phys. Lett. 79 (2001) 4348
21. Steffen H.J., Marton D., and Rabalais J.W. Phys. Rev. Lett. 68 (1992) 1726
22. Koike J., Parkin D.M., and Mitchell E.T. Appl. Phys. Lett. 60 (1992) 1450