Molecular dynamics simulations of the growth of thin a-C:H films under additional ion bombardment: Influence of the growth species and the Ar + ion kinetic energy

Chemical Vapor Deposition

Volumn 13, Issue 6-7, 2007, Pages 312-318

  Neyts, Erik ^a   Eckert, Maxie ^a   Bogaerts, Annemie ^a  

^a Plasma Laser Ablation and Surface Modeling ANTwerp (PLASMANT)   (Belgium)

Author keywords

Film growth; Hydrogenated amorphous carbon; Ion bombardment; Molecular dynamics simulations

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; ARGON; CARBON; CARBON FILMS; DYNAMICS; HYDROCARBONS; HYDROGEN; HYDROGENATION; HYDROGENOLYSIS; ION BOMBARDMENT; IONS; MOLECULAR DYNAMICS; NANOFLUIDICS; ORGANIC COMPOUNDS; PLASMA DEPOSITION; QUANTUM CHEMISTRY;

AMORPHOUS; C:H FILMS; EXPANDING THERMAL PLASMAS; GROWTH PROCESSES; GROWTH SPECIES; HYDROCARBON GROWTHS; HYDROGEN CONTENTS; HYDROGENATED AMORPHOUS CARBON; HYDROGENATED CARBON FILMS; ION ENERGIES; ION KINETIC ENERGIES; MOLECULAR DYNAMICS SIMULATIONS;

FILM GROWTH;

EID: 54949139641     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200606551     Document Type: Article

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