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Volumn 13, Issue 1, 2004, Pages 121-126
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Influence of the power on the processes controlling the formation of ECR-CVD carbon nitride films from CH4/Ar/N2 plasmas
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Author keywords
[No Author keywords available]
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Indexed keywords
OPTICAL EMISSION SPECTROSCOPY (OES);
PENNING MECHANISM;
ARGON;
CARBON NITRIDE;
CHEMICAL VAPOR DEPOSITION;
ELECTRON CYCLOTRON RESONANCE;
EMISSION SPECTROSCOPY;
HYDROGENATION;
LIGHT EMISSION;
MASS SPECTROMETRY;
METHANE;
NITROGEN;
SILICON;
X RAY SPECTROSCOPY;
PLASMAS;
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EID: 1642396733
PISSN: 09630252
EISSN: None
Source Type: Journal
DOI: 10.1088/0963-0252/13/1/015 Document Type: Article |
Times cited : (16)
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References (18)
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