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Journal of Applied Physics

Volumn 101, Issue 6, 2007, Pages

The effect of nitrogen incorporation on the bonding structure of hydrogenated carbon nitride films

(6) Camero, M a Buijnsters, J G a,e Gomez Aleixandre C a Gago, R b Caretti, I c Jimenez I a,d

a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID (Spain)

b CENTRO DE MICROANÁLISIS DE MATERIALES (Spain)

c UNIVERSITY OF ANTWERP (Belgium)

d INSTITUTO DE CIENCIA Y TECNOLOGÍA DE POLÍMEROS (Spain)

e RADBOUD UNIVERSITY NIJMEGEN (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; METHANE; NITROGEN COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

AMORPHOUS CARBON NETWORK; BONDING STRUCTURES; HYDROGENATED CARBON NITRIDE FILMS; NITROGENATION PROCESS;

THIN FILMS;

EID: 34047112222 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2712142 Document Type: Article

Times cited : (20)

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