Correlation of chemical composition and electrical properties of rf sputtered alumina films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 27, Issue 2, 2009, Pages 234-244

  Voigt, M ^a   Bergmaier, A ^b,c   Dollinger, G ^b   Sokolowski, M ^a  

^a UNIVERSITY OF BONN   (Germany)

^b BUNDESWEHR UNIVERSITY MUNICH   (Germany)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM; ATOMS; CHEMICAL ANALYSIS; ELECTRIC PROPERTIES; LEAKAGE CURRENTS; SURFACE MORPHOLOGY; TIN; TITANIUM COMPOUNDS;

ALUMINA FILMS; ALUMINUM OXIDES; ATOMIC CONCENTRATIONS; ATOMIC FORCES; ATOMIC RATIOS; BASE PRESSURES; BREAKDOWN FIELDS; CHEMICAL COMPOSITIONS; CURRENT VOLTAGE MEASUREMENTS; DEPTH PROFILES; ELASTIC RECOIL DETECTIONS; ELECTRICAL INSULATION PROPERTIES; ELECTRICAL PROPERTIES; ELEMENTAL COMPOSITIONS; ENERGETIC HEAVY-IONS; IMPEDANCE SPECTROSCOPIES; INDIUM TIN OXIDES; INSULATION PROPERTIES; ORDERS OF MAGNITUDES; RADIO FREQUENCY MAGNETRON SPUTTERING; RESIDUAL GAS; SPUTTER GAS; SPUTTER RATES; SUBSTRATE TEMPERATURES;

OXIDE FILMS;

EID: 61449241800     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3065978     Document Type: Article

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