Atomic layer deposition of TiN films by alternate supply of tetrakis(ethylmethylamino)-titanium and ammonia

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 4999-5004

  Min, Jae Sik ^a   Son, Young Woong ^a   Kang, Won Gu ^b   Chun, Soung Soon ^a   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b ToolGen Inc   (South Korea)

Author keywords

Alternate supply; Atomic layer deposition (ALD); TEMAT; TiN

Indexed keywords

AMINO ACIDS; AMMONIA; AMORPHOUS FILMS; CHEMISORPTION; DEPOSITION; HOLE TRAPS; PHASE DIAGRAMS; THICKNESS MEASUREMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ATOMIC LAYER DEPOSITION; REACTANT SOURCES; TETRAKISETHYLMETHYLAMINO TITANIUM;

TITANIUM NITRIDE;

EID: 0032156058     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4999     Document Type: Article

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