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Volumn 26, Issue 5, 2003, Pages 46-51
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Industry begins to embrace ALD
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE;
CAPACITORS;
CHEMICAL VAPOR DEPOSITION;
COMPOSITION;
DIELECTRIC FILMS;
MONOLAYERS;
MOSFET DEVICES;
PHYSICAL VAPOR DEPOSITION;
PRODUCTION CONTROL;
PULSED LASER DEPOSITION;
SEMICONDUCTOR DEVICE MANUFACTURE;
THICKNESS CONTROL;
THIN FILM TRANSISTORS;
TUNGSTEN;
ATOMIC LAYER DEPOSITION (ALD);
MOTOROLA (CO);
TORREX (CO);
WAFERS;
THIN FILMS;
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EID: 0344357212
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Review |
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Times cited : (22)
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References (0)
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