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Volumn 5470, Issue , 2004, Pages 107-121

Noise in Si/SiGe and Ge/SiGe MODFET

Author keywords

High frequency noise; Low frequency noise; Noise modeling; Physical modeling; SiGe HFET

Indexed keywords

HIGH FREQUENCY NOISE; LOW FREQUENCY NOISE; NOISE MODELING; PHYSICAL MODELING; SIGE HFET;

EID: 4344680993     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.546770     Document Type: Conference Paper
Times cited : (1)

References (57)
  • 1
    • 0031672575 scopus 로고    scopus 로고
    • Moore's law governs the silicon revolution
    • P. K.Bondyopadhyay. "Moore's law governs the silicon revolution". Proc IEEE 1998; 86: 78-81.
    • (1998) Proc IEEE , vol.86 , pp. 78-81
    • Bondyopadhyay, P.K.1
  • 2
    • 0000171304 scopus 로고    scopus 로고
    • Fundamental limits of Silicon technology
    • R.Keyes. "Fundamental limits of Silicon technology". Proc. of IEEE 2001; 89(3): 227-239.
    • (2001) Proc. of IEEE , vol.89 , Issue.3 , pp. 227-239
    • Keyes, R.1
  • 3
    • 0033076887 scopus 로고    scopus 로고
    • Silicon-germanium strained layers materials in microelectronics
    • Paul D.J., "Silicon-Germanium Strained Layers Materials in Microelectronics". Advanced Materials 1999; 11(3): 191-204.
    • (1999) Advanced Materials , vol.11 , Issue.3 , pp. 191-204
    • Paul, D.J.1
  • 8
    • 36449008939 scopus 로고
    • High hole mobility in SiGe alloys for device applications
    • K. Ismail, J.O. Chu, B.S. Meyerson, "High hole mobility in SiGe alloys for device applications," Appl. Phys. Lett. 64(23), 1994, pp. 3124-3126.
    • (1994) Appl. Phys. Lett. , vol.64 , Issue.23 , pp. 3124-3126
    • Ismail, K.1    Chu, J.O.2    Meyerson, B.S.3
  • 10
    • 30344472859 scopus 로고
    • x substrates
    • x substrates," Phys. Rev. B, vol. 48, no. 19, pp. 14276-14287, 1993.
    • (1993) Phys. Rev. B , vol.48 , Issue.19 , pp. 14276-14287
    • Rieger, M.1    Vogl, P.2
  • 13
    • 21544468810 scopus 로고
    • Room-temperature electron mobility in strained Si/SiGe heterostructures
    • S. F. Nelson, K. Ismail, J. O. Chu, and B. S. Meyerson, "Room-temperature electron mobility in strained Si/SiGe heterostructures," Appl. Phys. Lett., vol. 63, no. 3, pp. 367-369, 1993.
    • (1993) Appl. Phys. Lett. , vol.63 , Issue.3 , pp. 367-369
    • Nelson, S.F.1    Ismail, K.2    Chu, J.O.3    Meyerson, B.S.4
  • 14
    • 0032098013 scopus 로고    scopus 로고
    • SiGe Heterostructures for FET applications
    • T.E. Whall and E. H. C. Parker "SiGe Heterostructures for FET applications" J. Phys. D: Appl. Phys. 31 (1998) 1397-1416.
    • (1998) J. Phys. D: Appl. Phys. , vol.31 , pp. 1397-1416
    • Whall, T.E.1    Parker, E.H.C.2
  • 15
    • 0035390063 scopus 로고    scopus 로고
    • Quantum mechanics prescriptions for compound semiconductor transistor technologies
    • R. Anholt "Quantum mechanics prescriptions for compound semiconductor transistor technologies", Solid State Electronics, 45 (2001), pp. 1189-1197.
    • (2001) Solid State Electronics , vol.45 , pp. 1189-1197
    • Anholt, R.1
  • 17
    • 0032314806 scopus 로고    scopus 로고
    • Device parameter optimization of strained Si channel SiGe/Si n-MODFET's using a one-dimensional charge control model
    • G. Halkias, and A. Vegiri, "Device Parameter Optimization of strained Si Channel SiGe/Si n-MODFET's Using a One-Dimensional Charge Control Model," IEEE Trans. Electron Devices, vol. 45, no. 12, pp. 2430-2436, 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , Issue.12 , pp. 2430-2436
    • Halkias, G.1    Vegiri, A.2
  • 18
    • 0000290268 scopus 로고    scopus 로고
    • Theoretical hole mobility in a narrow Si/SiGe quantum well
    • B. Laikhtman and R.A. Kiehl, "Theoretical hole mobility in a narrow Si/SiGe quantum well", Phys. Rev. B, vol. 47, no. 16, pp. 10515-10527.
    • Phys. Rev. B , vol.47 , Issue.16 , pp. 10515-10527
    • Laikhtman, B.1    Kiehl, R.A.2
  • 19
    • 0000363279 scopus 로고    scopus 로고
    • Subband structure and mobility of two dimensional holes in strained Si/SiGe MOSFET's
    • R. Oberhuber, G. Zandler, P. Vogl, "Subband structure and mobility of two dimensional holes in strained Si/SiGe MOSFET's" Phys. Rev. Bt., vol. 58, no. 15, pp. 9941-9948, 1998.
    • (1998) Phys. Rev. Bt. , vol.58 , Issue.15 , pp. 9941-9948
    • Oberhuber, R.1    Zandler, G.2    Vogl, P.3
  • 20
    • 24244452766 scopus 로고    scopus 로고
    • Electronic transport properties of a two dimensional electron gas in a silicon quantum well structure at low temperature
    • A. Gold, "Electronic transport properties of a two dimensional electron gas in a silicon quantum well structure at low temperature", Phys. Rev. B, vol. 35, no. 2, pp. 723-733.
    • Phys. Rev. B , vol.35 , Issue.2 , pp. 723-733
    • Gold, A.1
  • 22
    • 0032490774 scopus 로고    scopus 로고
    • Four noise parameter determination method for transistors based on the frequency dependence of the noise figure
    • V. Danelon, P. Crozat, F. Aniel et G. Vernet, "Four noise parameter determination method for transistors based on the frequency dependence of the noise figure", Electronics Letters, vol. 34, no 16, pp. 1612-1614. 1998.
    • (1998) Electronics Letters , vol.34 , Issue.16 , pp. 1612-1614
    • Danelon, V.1    Crozat, P.2    Aniel, F.3    Vernet, G.4
  • 24
    • 0014638211 scopus 로고
    • The determination of device noise parameters
    • R. Q. Lane, "The determination of device noise parameters", Proc of IEEE, 1969, pp. 161-162.
    • (1969) Proc of IEEE , pp. 161-162
    • Lane, R.Q.1
  • 26
    • 84908220637 scopus 로고    scopus 로고
    • Noise characterization of InP based heterojunction bipolar transistor at microwave frequencies
    • Bordeaux, Septembre
    • V. Danelon, F. Aniel, M. Riet, P. Crozat, G. Vernet and R. Adde "Noise Characterization of InP Based Heterojunction Bipolar Transistor at Microwave Frequencies" Proc. of ESSDERC'98, Bordeaux, pp408-411, Septembre 1998.
    • (1998) Proc. of ESSDERC'98 , pp. 408-411
    • Danelon, V.1    Aniel, F.2    Riet, M.3    Crozat, P.4    Vernet, G.5    Adde, R.6
  • 33
    • 0016947365 scopus 로고
    • An efficient method for computer aided noise analysis of linear amplifier networks
    • H. Hillbrand, P.H. Russer "An efficient method for computer aided noise analysis of linear amplifier networks", IEEE Trans. on Circuits and Systems, CAS-23(4), 235-238, 1976.
    • (1976) IEEE Trans. on Circuits and Systems , vol.CAS-23 , Issue.4 , pp. 235-238
    • Hillbrand, H.1    Russer, P.H.2
  • 34
    • 84920737596 scopus 로고    scopus 로고
    • A straightforward noise de-embedding method and its application to high-speed silicon bipolar transistors
    • K. Aufinger , J. Böck , "A straightforward noise de-embedding method and its application to high-speed silicon bipolar transistors", Proc. of ESSDERC'96, 957-960, 1996.
    • (1996) Proc. of ESSDERC'96 , pp. 957-960
    • Aufinger, K.1    Böck, J.2
  • 35
    • 4344687107 scopus 로고    scopus 로고
    • Etude experimentale et modélisation physique des transistors III-V et IV-IV pour les applications mocroondes
    • F. Aniel, "Etude experimentale et modélisation physique des transistors III-V et IV-IV pour les applications mocroondes", Habilitation à diriger des recherches, 92-93, 2000.
    • (2000) Habilitation À Diriger des Recherches , pp. 92-93
    • Aniel, F.1
  • 36
    • 0031628485 scopus 로고    scopus 로고
    • Technology independent degradation of minimum noise figure due to pad parasitics
    • C.E. Biber et al. "Technology independent degradation of minimum noise figure due to pad parasitics", IEEE MTT-S 1, 145-148, 1998.
    • (1998) IEEE MTT-S , vol.1 , pp. 145-148
    • Biber, C.E.1
  • 37
    • 0027990097 scopus 로고
    • Bonding pads models for silicon VLSI technologies and their effects on noise figure of RF NPNs
    • Camilleri et al. "Bonding pads models for silicon VLSI technologies and their effects on noise figure of RF NPNs", IEEE MMWMCS, 225-228, 1994.
    • (1994) IEEE MMWMCS , pp. 225-228
    • Camilleri1
  • 38
    • 0024738288 scopus 로고
    • Modeling of noise parameters of MESFET's and MODFET's and their frequency temperature dependence
    • M. W. Pospieszalski, "Modeling of noise parameters of MESFET's and MODFET's and their frequency temperature dependence", IEEE-MTT, 37(9), 1340-1350, 1989.
    • (1989) IEEE-MTT , vol.37 , Issue.9 , pp. 1340-1350
    • Pospieszalski, M.W.1
  • 39
    • 0022811203 scopus 로고    scopus 로고
    • High frequency noise measurements on FET's with small dimensions
    • A.A. Abidi, "High Frequency Noise measurements on FET's with Small Dimensions", IEEE Trans. on Electron Devices, vol. 33, no. 11 pp. 1801-1805, 1996.
    • (1996) IEEE Trans. on Electron Devices , vol.33 , Issue.11 , pp. 1801-1805
    • Abidi, A.A.1
  • 40
    • 84937350176 scopus 로고
    • Thermal noise in field effect transistors
    • A. Van der Ziel, "Thermal noise in field effect transistors", Proc. IRE vol; 50, pp. 1808-1812, 1962.
    • (1962) Proc. IRE , vol.50 , pp. 1808-1812
    • Van Der Ziel, A.1
  • 44
    • 0036683922 scopus 로고    scopus 로고
    • Channel noise modeling of deep submicron MOSFETs
    • Chen CH, Deen MJ. Channel noise modeling of deep submicron MOSFETs. IEEE Trans. Electron Dev 2002; 49(8): 1484-7.
    • (2002) IEEE Trans. Electron Dev , vol.49 , Issue.8 , pp. 1484-1487
    • Chen, C.H.1    Deen, M.J.2
  • 45
    • 0023844609 scopus 로고    scopus 로고
    • Noise modeling and measurements techniques
    • A. Cappy, "Noise Modeling and Measurements techniques", IEEE Trans on Microwave Theory and Techniques, vol. 36 no. 1, pp. 1-10, 1998.
    • (1998) IEEE Trans on Microwave Theory and Techniques , vol.36 , Issue.1 , pp. 1-10
    • Cappy, A.1
  • 46
    • 0000853776 scopus 로고    scopus 로고
    • x heterostructures: Electron transport and field-effect transistor operation using Monte-Carlo simulation
    • x heterostructures: Electron transport and field-effect transistor operation using Monte-Carlo simulation, Journal Applied Phys. 82 (1997) 3911-3916.
    • (1997) Journal Applied Phys. , vol.82 , pp. 3911-3916
    • Dollfus, P.1
  • 48
    • 1242307305 scopus 로고    scopus 로고
    • 0.7 metamorphic metal-oxide-semiconductor field-effect transistor
    • 0.7 metamorphic metal-oxide-semiconductor field-effect transistor" Applied Physics Letters, Vol. 84, N. 4, 2004 pp 610-612.
    • (2004) Applied Physics Letters , vol.84 , Issue.4 , pp. 610-612
    • Myronov, M.1
  • 49
    • 4344565612 scopus 로고    scopus 로고
    • Noise in p-channel SiGe and si MOSFETs with gate oxide grown by low temperature plasma anodisation
    • Vienna
    • N. B.Lukyanchikova et al., "Noise in p-channel SiGe and si MOSFETs with gate oxide grown by low temperature plasma anodisation", Proceedings EDMO, 2001, Vienna.
    • (2001) Proceedings EDMO
    • Lukyanchikova, N.B.1
  • 50
    • 0027592078 scopus 로고
    • Noise in AlGaAs/InGaAs/GaAs pseudomorphic HEMT's from 10 Hz to 10 GHz
    • May
    • Robert Plana, LaurentEscotte, "Noise in AlGaAs/InGaAs/GaAs Pseudomorphic HEMT's from 10 Hz to 10 GHz", IEEE Trans Electron. Devices, Vol. 40 No. 5 May 1993.
    • (1993) IEEE Trans Electron. Devices , vol.40 , Issue.5
    • Plana, R.1    Escotte, L.2
  • 51
    • 4344609260 scopus 로고    scopus 로고
    • Microwave strained Si HFETs: State of the art and future trends
    • M. Enciso et al. "Microwave Strained Si HFETs: State of the art and future trends", Solid State Elect. (2004).
    • (2004) Solid State Elect.
    • Enciso, M.1
  • 57
    • 0028548483 scopus 로고
    • Flicker Noise in CMOS transistors from Subthreshold to strong inversion at various temperatures
    • J. Chang, et al., "Flicker Noise in CMOS transistors from Subthreshold to strong inversion at various temperatures", IEEE Trans. Electron Devices, vol. 41, no. 11, pp. 1965-1971, 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , Issue.11 , pp. 1965-1971
    • Chang, J.1


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