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Volumn 516, Issue 10, 2008, Pages 2966-2972

Initial surface reactions in atomic layer deposition of HfSixOy and HfO2: A comparative study by density functional theory

Author keywords

Ab initio calculation; Chemisorption; Dielectrics; Hafnium

Indexed keywords

CHEMISORPTION; DENSITY FUNCTIONAL THEORY; HAFNIUM COMPOUNDS; OXIDATION; SILICON; SURFACE REACTIONS;

EID: 39749155139     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.107     Document Type: Article
Times cited : (7)

References (38)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.