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Volumn 27, Issue 1-2, 2003, Pages 75-80

DFT investigation of HfCl4 decomposition on hydroxylated SiO2: First stage of HfO2 atomic layer deposition

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION;

EID: 0037370121     PISSN: 09270256     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0256(02)00428-7     Document Type: Conference Paper
Times cited : (42)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.