Oxidation processes on the H2O-chemisorbed Si(100) surface studied by in-situ infrared spectroscopy

Surface Science

Volumn 401, Issue 3, 1998, Pages 364-370

  Niwano, Michio ^a   Terashi, Miyako ^a   Shinohara, Masanori ^a   Shoji, Daisei ^a   Miyamoto, Nobuo ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU GAKUIN UNIVERSITY   (Japan)

Author keywords

Chemisorption; Infrared; Oxidation; Reflection spectroscopy; Silicon; Water

Indexed keywords

ANNEALING; CHEMICAL BONDS; CHEMISORPTION; DESORPTION; DISSOCIATION; HYDROGEN; INFRARED SPECTROSCOPY; MOLECULES; OXIDATION; OXYGEN; SEMICONDUCTING SILICON; WATER;

IN SITU INFRARED ABSORPTION SPECTROSCOPY; REFLECTION SPECTROSCOPY;

SURFACES;

EID: 0032045528     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00023-5     Document Type: Article

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