Boundary layer chemistry probed by in situ infrared spectroscopy during SiO 2 deposition at atmospheric pressure from tetraethylorthosilicate and ozone

Journal of Physical Chemistry B

Volumn 109, Issue 34, 2005, Pages 16544-16553

  Flores, Lucio D ^a,b   Crowell, John E ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD); ETHOXYSILANOL; ORGANIC PRODUCTS; TETRAETHYLORTHOSILICATE (TEOS);

ABSORPTION; ACETIC ACID; ATMOSPHERIC PRESSURE; BOUNDARY LAYERS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FORMALDEHYDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH TEMPERATURE EFFECTS; OZONE; REACTION KINETICS;

SILICA;

EID: 24744454694     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0518658     Document Type: Article

References (48)

1. 2 and BPSG, 3rd Annual Dielectrics and CVD Metallization Symposium, San Diego, CA, 1991.
2. Bonifield, T.; Hewes, K.; Merritt, B.; Robinson, R.; Fisher, S.; Maisch, D. Semicond. Int. 1993, 16, 200.
3. Fry, H. W.; West, J. P.; Poon, S.; Boeck, B. A.; Yu, C. C. Solid State Technol. 1994, 37, 31.
4. Yuan, Z.; Mokhtari, S.; Ferdinand, A.; Eakin, J.; Bartholomew, L. Thin Solid Films 1996, 290-291, 422.
5. 2 Film Conformality in Atmospheric Pressure Chemical Vapor Deposition. PCT Int. Appl. 1998 Patent W09836106; US Patent 5,855,957.
6. Tsukamoto, K.; Cheng, D. G.; Komiyama, H.; Nishimoto, Y.; Tokumasu, N.; Maeda, K. Jpn. J. Appl. Phys., Part 2 1999, 38, L68.
7. Adachi, M.; Okuyama, K.; Fujimoto, T.; Sato, J.; Muroyama, M. Jpn. J. Appl. Phys., Part 1 1996, 35, 4438.
8. Shareef, I. A.; Rubloff, G. W.; Anderle, M.; Gill, W. N.; Cotte, J.; Kim, D. H. J. Vac. Sci. Technol., B 1995, 13, 1888.
9. Shareef, I. A.; Rubloff, G. W.; Gill, W. N. J. Vac. Sci. Technol., B 1996, 14, 772.
10. Kim, E. J.; Gill, W. N. Korean J. Chem. Eng. 1998, 15, 56.
11. Kim, E. J.; Gill, W. N. J. Electrochem. Soc. 1994, 141, 3462.
12. Kim, E. J.; Gill, W. N. J. Cryst. Growth 1994, 140, 308.
13. Kim, E. J.; Gill, W. N. J. Cryst. Growth 1994, 140, 315.
14. Kawahara, T.; Yuuki, A.; Matsui, Y. Jpn. J. Appl. Phys., Part 1 1992, 31, 2925.
15. Whidden, T. K.; Lee, S. Y. Electrochem. Solid-State Lett. 1999, 2, 527.
16. Maeda, M.; Ikeda, K. Jpn. J. Appl. Phys., Part 1 1994, 33, 2703.
17. Ikeda, K.; Nakayama, S.; Maeda, M. J. Electrochem. Soc. 1995, 142, 1659.
18. Ikeda, K.; Maeda, M. Jpn. J. Appl. Phys., Part 1 1996, 35, 1573.
19. Ikeda, K.; Maeda, M. Proceedings of the Electrochemical Society 1997, 97-25, 917.
20. Sanogo, O.; Zachariah, M. R. J. Electrochem. Soc. 1997, 144, 2919.
21. Wrobel, A. M.; Walkiewicz-Pietrzykowska, A.; Stasiak, M.; Kulpinski, J. Chem. Vap. Deposition 1996, 2, 285.
22. Wrobel, A. M.; Walkiewicz-Pietrzykowska, A.; Wickramanayaka, S.; Hatanaka, Y. J. Electrochem. Soc. 1998, 145, 2866.
23. Wrobel, A. M.; Walkiewicz-Pietrzykowska, A.; Hatanaka, Y.; Wickramanayaka, S.; Nakanishi, Y. Chem. Mater. 2001, 13, 1884.
24. Wrobel, A. M.; Walkiewicz-Pietrzykowska, A.; Stasiak, M.; Kulpinski, J. Chem. Vap. Deposition 1997, 3, 73.
25. Wrobel, A. M. Acetoxy-triethoxysilane formation during remote oxygen plasma-CVD, private communication, Dec. 2001.
26. Ho, P.; Melius, C. F. J. Phys. Chem. 1995, 99, 2166.
27. Arno, J.; Yuan, Z.; Murphy, S. J. Electrochem. Soc. 1999, 146, 276.
28. Mucha, J. A.; Washington, J. Mater. Res. Soc. Symp. Proc. 1994, 334, 31.
29. Bailey, P. S. Ozonation in Organic Chemistry; Academic Press: London, 1978; Vol. 1.
30. 2 from TEOS and Ozone Using In Situ Infrared Spectroscopy: Effects of Phosphorus and Boron on the Gas Phase Chemistry. Ph.D. Thesis, University of California at San Diego, La Jolla, CA, 2004.
31. Dobkin, D. M.; Mokhtari, S.; Schmidt, M.; Pant, A.; Robinson, L.; Sherman, A. J. Electrochem. Soc. 1995, 142, 2332.
32. Kim, E. J.; Gill, W. N. J. Electrochem. Soc. 1995, 142, 676.
33. Nieto, J. P.; Caussat, B.; Couderc, J. P.; Orain, I.; Jeannerot, L. J. Phys. IV 2002, 12, 37.
34. Ho, P. Chemical Reactions in TEOS/OZONE Chemical Vapor Deposition; Sandia National Laboratories: Albuquerque, NM, 2000.
35. 2 CVD; Sandia National Laboratories: Albuquerque, NM, 1997.
36. Romet, S.; Couturier, M. F.; Whidden, T. K. J. Electrochem. Soc. 2001, 148, G82.
37. Weiller, B. H. Mater. Res. Soc. Symp. Proc. 1994, 334, 379.
38. Nakagawa, T.; Yamada, K.; Kuchitsu, K. J. Mol. Spectrosc. 1976, 63, 485.
39. Vandervis, M. G. M.; Cordfunke, E. H. P.; Konings, R. J. M. J. Phys. IV 1993, 3, 75.
40. Moortgat, G. K.; Cox, R. A.; Shuster, G.; Burrows, J. P.; Tyndall, G. S. J. Chem. Soc., Faraday Trans. 1989, 85, 809.
41. Horie, O.; Moortgat, G. K. J. Chem. Soc., Faraday Trans. 1992, 88, 3305.
42. Maker, P. D.; Niki, H.; Savage, C. M.; Breitenbach, L. P. Anal. Chem. 1977, 49, 1346.
43. Schott, V. G.; Engelbrecht, L.; Holdt, H. J. Z. Anorg. Allg. Chem. 1979, 459, 177.
44. Holdt, H. J.; Schott, G.; Popowski, E.; Kelling, H. Z. Chem. 1983, 23, 252.
45. Holdt, H. J.; Popowski, E.; Kelling, H. Z. Anorg. Allg. Chem. 1984, 519, 233.
46. Komissarov, V. D.; Komissarova, I. N.; Farrakhova, G. K.; Denisov, E. T. Izv. Akad. Nauk SSSR, Ser. Khim. 1979, 6, 1205.
47. Shereshovets, V. V.; Komissarov, V. D.; Denisov, E. T. Izv. Akad. Nauk SSSR, Ser. Khim. 1979, 6, 1212.
48. Mondragón, M. A., et al. Vib. Spectrosc. 1995, 9, 293-304.