Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 6, Issue 2, 2007, Pages

  Orji, Ndubuisi G ^a   Dixson, Ronald G ^a   Martinez, Angela ^b   Bunday, Benjamin D ^c   Allgair, John A ^c   Vorburger, Theodore V ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Advanced Technology Development Facility Inc   (United States)

^c SEMATECH   (United States)

Author keywords

Critical dimension atomic force microscope; Height; Linewidth; Metrology; Pitch; Reference measurement system; Traceability

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRITICAL PATH ANALYSIS; LINEWIDTH; TRACKING (POSITION); UNCERTAIN SYSTEMS;

CRITICAL-DIMENSION ATOMIC FORCE MICROSCOPE; REFERENCE MEASUREMENT SYSTEMS (RMS); UNCERTAIN SOURCES;

SEMICONDUCTOR DEVICE TESTING;

EID: 34548043267     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.2728742     Document Type: Review

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