Reference metrology using a next generation CD-AFM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 633-646

  Dixson, Ronald ^a,b   Guerry, Angela ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

AFM; Calibration; CD; Linewidth; Metrology; Reference measurement system; Standards; Traceability

Indexed keywords

CRITICAL DIMENSIONS (CD); LINEWIDTH; REFERENCE MEASUREMENT SYSTEM (RMS); TRACEABILITY;

ATOMIC FORCE MICROSCOPY; CALIBRATION; MASKS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; STANDARDS;

MEASUREMENT THEORY;

EID: 4344592070     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536898     Document Type: Conference Paper

References (31)

1. R. Dixson, A. Guerry, M. Bennett, T. Vorburger, B. Bunday, "Implementation of a Reference Measurement System using CD-AFM," SPIE Proceedings Vol. 5038, pp. 150-165 (2003).
2. R. Dixson, A. Guerry, M. Bennett, T. Vorburger, M. Postek, "Toward Traceability for At Line AFM Dimensional Metrology," SPIE Proceedings Vol. 4689, pp. 313-335 (2002).
3. B. Banke, C. Archie, "Characteristics of Accuracy for CD metrology," SPIE Proceedings Vol. 3677, pp. 291-308 (1999).
4. D. Nyyssonen, R. D. Larrabee, J. Res. Natl. Bur. Stand. 92, 187-204 (1987).
5. J. Potzick, "Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology," SPIE Proceedings Vol. 1087, pp. 165-178 (1989).
6. J. Fu, T. Vorburger, "The Calibration of Scanning Electron Microscope Magnification Standards SRM484," SPIE Proceedings Vol. 2725, pp. 608-614 (1996).
7. J. Fu, M. C. Croarkin, T. V. Vorburger, "The measurement and uncertainty of a calibration standard for the scanning electron microscope," J. Res. Natl. Inst. Stand. Technol. 99, p. 191 (1994).
8. M. T. Postek, "Scanning Electron Microscope-based Metrological Electron Microscope System and New Prototype Scanning Electron Microscope Magnification Standard," Scanning Microscopy, Vol. 3, pp. 1087-1099 (1989).
9. M. T. Postek, A. E. Vladar, S. N. Jones, W. J. Keery, "Interlaboratory Study on the Lithographically Produced Scanning Electron Microscope Magnification Standard Prototype," J. Res. Natl. Bur. Stand. 98, 447-467 (1993).
10. R. Dixson, R. Köning, J. Fu, T. Vorburger, B. Renegar, "Accurate Dimensional Metrology with Atomic Force Microscopy," SPIE Proceedings Vol. 3998, pp. 362-368 (2000).
11. R. Dixson, R. Köning, V.W. Tsai, J. Fu, T.V. Vorburger, "Dimensional Metrology with the NIST Calibrated Atomic Force Microscope," SPIE Proceedings Vol. 3677, 20-34, (1999).
12. R. Köning, R. Dixson, J. Fu, V. W. Tsai, T. B. Renegar, T. Vorburger, "Improving Step Height and Pitch Measurements using the Calibrated Atomic Force Microscope," in Proceedings of the 3rd Seminar on Quantitative Microscopy held in Copenhagen, Denmark, 5-6th November 1998, K. Hasche, W. Mirande, G. Wilkening, eds.; PTB-Bericht F-34, p. 68-74; Physikalisch-Technische Bundesanstalt, Braunschweig, Germany (1998).
13. R. Dixson, R. Köning, T. V. Vorburger, J. Fu, V. W. Tsai, "Measurement of pitch and width samples with the NIST calibrated atomic force microscope," SPIE Proceedings Vol. 3332, 420-432 (1998).
14. R. Köning, R. Dixson, J. Fu, V. W. Tsai, T. V. Vorburger, E. D. Williams, and X. S. Wang, "Pitch and Step Height Measurements using the Calibrated Atomic Force Microscope," in Proceedings of the 2nd Seminar on Quantitative Microscopy held in Vienna, Austria, 6-7th November 1997, K. Hasche, W. Mirandé and G. Wilkening, eds.; PTB-report F-30, pp. 172-176, PTB Braunschweig, Germany (1998).
15. J. Schneir, T. McWaid, J. Alexander, and B. P.Wifley, "Design of an atomic force microscope with interferometric position control," J. Vac. Sci. Technol. B, 12(6), 3561 (1994).
16. A. C. Diebold, "Silicon Semiconductor Metrology," in Handbook of Silicon Semiconductor Metrology (edited by A.C. Diebold), published by Marcel Dekker, pp. 1 - 15 (2001).
17. SEMI E89: Guide for measurement system capability analysis, SEMI, San Jose (1999).
18. Guide to the Expression of Uncertainty in Measurement, International Organization for Standardization, Geneva (1995).
19. B. N. Taylor and C. E. Kuyatt, Guidelines for Evaluating and Expressing the Uncertainty of NIST Measurement Results, NIST Tech. Note 1297, (1994).
20. B. D. Bunday, M. Bishop, "Specifications and Methodologies for Benchmarking of Advanced CD-SEMs at the 90 nm CMOS Technology Node and Beyond," SPIE Proceedings Vol. 5038, p.p. 1038-1052 (2003).
21. B. D. Bunday, M. Bishop, "Benchmarking of advanced CD-SEMs at the 130 nm CMOS Technology node," SPIE Proceedings Vol. 4689, 102-115 (2002).
22. N. Sullivan, R. Dixson, B. Bunday, M. Mastovich, P. Knutrud, P. Fahre, R. Brandom, "Electron Beam Metrology of 193 nm Resists at Ultra Low Voltage," SPIE Proceedings Vol. 5038, p.p. 483-492 (2003).
23. R. A. Allen, M. W. Cresswell, C. E. Murabito, R. G. Dixson, E. H. Bogardus, "Critical Dimension Calibration Standards for ULSI Metrology," in Characterization and Metrology for VLSI Technology, AIP Conference Proceedings Vol. 683, pp. 421-428 (2003).
24. M. W. Cresswell, E. H. Bogardus, J. V. Martinez de Pinillos, M. H. Bennett, R. A. Allen, W. F. Guthrie, C. E. Murabito, B. A. am Ende, L. W. Linholm, "CD Reference Materials for Sub-Tenth Micrometer Applications," SPIE Proceedings Vol. 4689, 116-127 (2002).
25. J. Villarrubia, R. Dixson, S. Jones, J. R. Lowney, M. T. Postek, R. A. Allen, M. W. Cresswell, "Intercomparison of SEM, AFM, and electrical linewidths," SPIE Proceedings Vol 3677, 587 - 440 (1999).
26. R. Dixson, N. G. Orji, J. Fu, V. Tsai, E. D. Williams, R. Kacker, T. Vorburger, H. Edwards, D. Cook, P. West, R. Nyffenegger, "Silicon Single Atom Steps as AFM Height Standards," SPIE Proceedings Vol. 4344, 157 - 168 (2001).
27. J. S. Villarrubia, A. E. Vladar, M. T. Postek, "A Simulation Study of Repeatability and Bias in the CD-SEM," SPIE Proceedings Vol. 5038, 138 - 149 (2003).
28. J. S. Villarrubia, A. E. Vladar, J. R. Lowney, M. T. Postek, "Scanning electron microscope analog of scatterometry," SPIE Proceedings Vol. 4689, 304 - 312 (2002).
29. J. S. Villarrubia, A. E. Vladar, J. R. Lowney, M. T. Postek, "Edge determination of polycrystalline silicon lines on gate oxide," SPIE Proceedings Vol. 4344, 147 - 156 (2001).
30. X. Zhao, W. Chu, J. Fu, T. Vorburger, "Image Splicing for Linewidth Measurement," to be published in SPIE Proceedings Vol. 5375 (2004).
31. X. Zhao, T. V. Vorburger, J. Fu, J. Song, C. V. Nguyen, "A Model for Step Height, Edge Slope and Linewidth Measurements Using AFM," in Characterization and Metrology for ULSI Technology, AIP Conference Proceedings Vol. 683, pp. 400 - 408 (2003).