Scanning electron microscope matching and calibration for critical dimensional metrology

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2155-2161

  Marchman, Herschel ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010364195     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589344     Document Type: Article

References (9)

1. D. Nyssonen and R. Larrabee, NIST J. Res. 92, 195.
2. M. Postek and R. Larrabee, Solid-State Electron. 36, 673 (1993).
3. H. Marchman, J. Griffith, C. Pierrat, and S. Vadia, J. Vac. Sci. Technol. B 11, 2482 (1993).
4. H. M. Marchman, J. E. Griffith, J. Z. Y. Guo, and C. K. Celler, J. Vac. Sci. Technol. B 12, 3585 (1994).
5. O. Wolter, Th. Bayer, and J. Gresshner, J. Vac. Sci. Technol. B 9, 1353 (1991).
6. Nanoedge sample is supplied with the Veeco SXM System and manufactured by IBM.
7. K. Monohan, H. Marchman, and H. Sewell, Microlithography, Proc. SPIE (SPIE, Bellingham, 1997).
8. J. Griffith, H. Marchman, M. Vasile, and L. Hopkins, J. Vac. Sci. Technol. B 11, 2473 (1993).
9. K. Monohan, H. Marchman, and H. Sewell, Microlithography, Proc. SPIE (SPIE, Bellingham, 1997).