Traceable pico-meter level step height metrology

Wear

Volumn 257, Issue 12 SPEC.ISS., 2004, Pages 1264-1269

  Orji, Ndubuisi G ^a   Dixson, Ronald G ^b   Fu, Joseph ^b   Vorburger, Theodore V ^b  

^a University of North Carolina at Charlotte   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Atomic force microscope; Single atomic steps; Step height

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; CODES (STANDARDS); COMPUTATIONAL METHODS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON;

CALIBRATED ATOMIC FORCE MICROSCOPES (C-AFM); METROLOGY TOOLS;

SURFACE TOPOGRAPHY;

INDUSTRIAL APPLICATION; MEASUREMENT METHOD; MICROSCOPY; SEMICONDUCTOR;

EID: 10044268454     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.wear.2004.04.009     Document Type: Conference Paper

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